Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8622021 | High lifetime consumable silicon nitride-silicon dioxide plasma processing components | Travis R. Taylor, Mukund Srinivasan, K. Y. Ramanujam, Biljana Mikijelj, Shanghua Wu | 2014-01-07 |
| 8522716 | Protective coating for a plasma processing chamber part and a method of use | Jon McChesney, Eric A. Pape, Rajinder Dhindsa | 2013-09-03 |
| 6887340 | Etch rate uniformity | Rajinder Dhindsa | 2005-05-03 |