Issued Patents All Time
Showing 26–36 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7109458 | Confocal wafer depth scanning inspection method | Christopher R. Fairley, Bin-Ming Benjamin Tsai, Scott A. Young | 2006-09-19 |
| 7061625 | Method and apparatus using interferometric metrology for high aspect ratio inspection | Shiow-Hwei Hwang | 2006-06-13 |
| 6867406 | Confocal wafer inspection method and apparatus using fly lens arrangement | Christopher R. Fairley, Bin-Ming Benjamin Tsai, Scott A. Young | 2005-03-15 |
| 6816249 | High throughput brightfield/darkfield wafer inspection system using advanced optical techniques | Christopher R. Fairley, Gershon Perelman, Bin-Ming Benjamin Tsai | 2004-11-09 |
| 6584218 | Automated photomask inspection apparatus | Mark J. Wihl, Marek Zywno, Damon F. Kvamme, Michael E. Fein | 2003-06-24 |
| 6363166 | Automated photomask inspection apparatus | Mark J. Wihl, Marek Zywno, Damon F. Kvamme, Michael E. Fein | 2002-03-26 |
| 6288780 | High throughput brightfield/darkfield wafer inspection system using advanced optical techniques | Christopher R. Fairley, Gershon Perelman, Bin-Ming Benjamin Tsai | 2001-09-11 |
| 6052478 | Automated photomask inspection apparatus | Mark J. Wihl, Marek Zywno, Damon F. Kvamme, Michael E. Fein | 2000-04-18 |
| 5737072 | Automated photomask inspection apparatus and method | David G. Emery, Zain Saidin, Mark J. Wihl, Marek Zywno, Damon F. Kvamme +1 more | 1998-04-07 |
| 5572598 | Automated photomask inspection apparatus | Mark J. Wihl, Marek Zywno, Damon F. Kvamme, Michael E. Fein | 1996-11-05 |
| 5563702 | Automated photomask inspection apparatus and method | David G. Emery, Zain Saidin, Mark J. Wihl, Marek Zywno, Damon F. Kvamme +1 more | 1996-10-08 |