YN

Yoichiro Numasawa

AN Anelva: 8 patents #12 of 280Top 5%
Canon: 3 patents #11,241 of 19,416Top 60%
UL Ulvac: 2 patents #199 of 680Top 30%
KC Kanto Denka Kogyo Co.: 2 patents #29 of 140Top 25%
HE Hitachi Kokusai Electric: 2 patents #354 of 843Top 45%
SC Sanyo Electric Co.: 2 patents #2,557 of 6,347Top 45%
TL Tokyo Electron Limited: 2 patents #2,602 of 5,567Top 50%
PA Panasonic: 1 patents #13,264 of 21,108Top 65%
RE Renesas Electronics: 1 patents #2,739 of 4,529Top 65%
RT Renesas Technology: 1 patents #1,991 of 3,337Top 60%
SL Semiconductor Energy Laboratory: 1 patents #942 of 1,113Top 85%
Sumitomo Electric Industries: 1 patents #13,249 of 21,551Top 65%
UN Unknown: 1 patents #29,356 of 83,584Top 40%
Overall (All Time): #419,719 of 4,157,543Top 15%
12
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
9437768 Photoelectric conversion device Yasushi Maeda, Yoshikazu HIURA, Shunpei Yamazaki 2016-09-06
8002947 Plasma treatment system and cleaning method of the same Yoshimi Watabe 2011-08-23
7666763 Nanosilicon semiconductor substrate manufacturing method and semiconductor circuit device using nanosilicon semiconductor substrate manufactured by the method Yukinobu Murao, Akira Kumagai 2010-02-23
7589002 Method of forming an oxygen- or nitrogen-terminated silicon nanocrystalline structure and an oxygen- or nitrogen-terminated silicon nanocrystalline structure formed by the method Yukinobu Murao 2009-09-15
7530359 Plasma treatment system and cleaning method of the same Yoshimi Watabe 2009-05-12
7091138 Forming method and a forming apparatus of nanocrystalline silicon structure Nobuyoshi Koshida 2006-08-15
6664496 Plasma processing system Yoshimi Watabe, Shinya Hasegawa, Yukito Nakagawa 2003-12-16
6083361 Sputter device Masahiko Kobayashi 2000-07-04
6070552 Substrate processing apparatus Shigeru Mizuno, Masahito Ishihara, Nobuyuki Takahashi 2000-06-06
6059985 Method of processing a substrate and apparatus for the method Takanori Yoshimura, Shigeru Mizuno, Shinya Hasegawa, Nobuyuki Takahashi 2000-05-09
6016765 Plasma processing apparatus Shinya Hasegawa, Tsutomu Tsukada, Nobuyuki Takahashi 2000-01-25
5956616 Method of depositing thin films by plasma-enhanced chemical vapor deposition Shigeru Mizuno, Manabu Tagami, Shinya Hasegawa, Masahito Ishihara, Kiyoshi Nashimoto +1 more 1999-09-21