WD

Wiebe B. deBoer

ET Epsilon Technology: 7 patents #3 of 9Top 35%
AA Advanced Semiconductor Materials America: 3 patents #6 of 26Top 25%
Overall (All Time): #328,371 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
5902407 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment Albert E. Ozias 1999-05-11
5435682 Chemical vapor desposition system Richard Crabb, McDonald Robinson, Mark Hawkins, Dennis L. Goodwin, Armand P. Ferro +1 more 1995-07-25
5427620 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment Albert E. Ozias 1995-06-27
5374315 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment Albert E. Ozias 1994-12-20
5318634 Substrate supporting apparatus Albert E. Ozias 1994-06-07
5198034 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment Albert E. Ozias 1993-03-30
5117769 Drive shaft apparatus for a susceptor Albert E. Ozias 1992-06-02
5092728 Substrate loading apparatus for a CVD process Richard Crabb, McDonald Robinson, Mark Hawkins, Dennis L. Goodwin, Armand P. Ferro +1 more 1992-03-03
4996942 Rotatable substrate supporting susceptor with temperature sensors Albert E. Ozias 1991-03-05
4993355 Susceptor with temperature sensing device Albert E. Ozias 1991-02-19
4828224 Chemical vapor deposition system Richard Crabb, McDonald Robinson, Mark Hawkins, Dennis L. Goodwin, Armand P. Ferro +1 more 1989-05-09
4821674 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment Albert E. Ozias 1989-04-18
4798165 Apparatus for chemical vapor deposition using an axially symmetric gas flow Klavs F. Jensen, Wayne Johnson, Gary W. Read, McDonald Robinson 1989-01-17
4789771 Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus McDonald Robinson, Ronald D. Behee, Wayne Johnson 1988-12-06
4654509 Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus McDonald Robinson, Ronald D. Behee, Wayne Johnson 1987-03-31