Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11024769 | Group III nitride semiconductor light-emitting element and method of manufacturing same | Yasuhiro Watanabe | 2021-06-01 |
| 10573783 | Group III nitride semiconductor light-emitting element and method of manufacturing same | Yasuhiro Watanabe | 2020-02-25 |
| 10283671 | Method of producing III nitride semiconductor light-emitting device | Yasuhiro Watanabe | 2019-05-07 |
| 10193016 | III-nitride semiconductor light emitting device and method of producing the same | Yasuhiro Watanabe | 2019-01-29 |
| 10147842 | Method of producing III nitride semiconductor light-emitting device | Yasuhiro Watanabe | 2018-12-04 |
| 10062806 | Method of producing III nitride semiconductor light-emitting device and III nitride semiconductor light-emitting device | Yasuhiro Watanabe | 2018-08-28 |
| 9882088 | III nitride semiconductor light-emitting device | Yasuhiro Watanabe | 2018-01-30 |
| 8980679 | Apparatus and methods for forming phase change layer and method of manufacturing phase change memory device | Dong-Hyun Im, Byoungjae Bae, Dohyung Kim, Sunglae Cho, Jinil Lee +2 more | 2015-03-17 |
| 8168270 | Film formation method and apparatus for semiconductor process | Kazuhide Hasebe, Yoshihiro Ishida, Jun Ogawa, Shigeru Nakajima | 2012-05-01 |
| 8153451 | System and method for performing semiconductor processing on target substrate | Koichi Sakamoto, Yamato Tonegawa | 2012-04-10 |
| 8124181 | Oxidation method providing parallel gas flow over substrates in a semiconductor process | Kazuhide Hasebe, Shigeru Nakajima, Jun Ogawa | 2012-02-28 |
| 7938080 | Method for using film formation apparatus | Naotaka Noro, Yamato Tonegawa, Norifumi Kimura | 2011-05-10 |
| 7906168 | Film formation method and apparatus for forming silicon oxide film | Kazuhide Hasebe, Yoshihiro Ishida, Jun Ogawa, Shigeru Nakajima | 2011-03-15 |
| 7795158 | Oxidation method and apparatus for semiconductor process | Jun Ogawa, Shigeru Nakajima, Kazuhide Hasebe | 2010-09-14 |
| 7648895 | Vertical CVD apparatus for forming silicon-germanium film | Masaki Kurokawa, Katsuhiko Komori, Norifumi Kimura, Kazuhide Hasebe, Akitake Tamura +1 more | 2010-01-19 |
| 7494943 | Method for using film formation apparatus | Naotaka Noro, Yamato Tonegawa, Norifumi Kimura | 2009-02-24 |
| 7273818 | Film formation method and apparatus for semiconductor process | Masaki Kurokawa, Norifumi Kimura, Yoshikazu Furusawa, Katsuhiko Komori, Kazuhide Hasebe | 2007-09-25 |
| 7211514 | Heat-processing method for semiconductor process under a vacuum pressure | Akitake Tamura, Keisuke Suzuki, Kazuhide Hasebe, Mitsuhiro Okada | 2007-05-01 |
| 7179334 | System and method for performing semiconductor processing on substrate being processed | Koichi Sakamoto, Yamato Tonegawa | 2007-02-20 |