TA

Tanuj Aggarwal

CY Cymer: 14 patents #32 of 339Top 10%
AB Asml Netherlands B.V.: 4 patents #960 of 3,192Top 35%
Overall (All Time): #342,431 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
11769982 Lithography system bandwidth control 2023-09-26
11050213 Online calibration for repetition rate dependent performance variables Joshua Jon Thornes, Kevin M. O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt 2021-06-29
10892594 Gas optimization in a gas discharge light source 2021-01-12
10833471 Lithography system bandwidth control 2020-11-10
10727642 Online calibration for repetition rate dependent performance variables Joshua Jon Thornes, Kevin M. O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt 2020-07-28
10627724 Lithographic apparatus and method Frank Everts, Wilhelmus Patrick Elisabeth Maria OP 'T ROOT, Herman Philip Godfried, Joshua Jon Thornes, Kevin M. O'Brien +1 more 2020-04-21
10218147 Gas optimization in a gas discharge light source 2019-02-26
10096969 Method for dither free adaptive and robust dose control for photolithography 2018-10-09
10090629 Gas mixture control in a gas discharge light source Rahul Ahlawat 2018-10-02
10036963 Estimating a gain relationship of an optical source 2018-07-31
9939732 Controller for an optical system 2018-04-10
9819136 Gas mixture control in a gas discharge light source Rahul Ahlawat 2017-11-14
9762023 Online calibration for repetition rate dependent performance variables Joshua Jon Thornes, Kevin M. O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt 2017-09-12
9634455 Gas optimization in a gas discharge light source 2017-04-25