| 6277546 |
Process for imaging of photoresist |
Gregory Breyta, William D. Hinsberg, Donald C. Hofer, Hiroshi Ito, Scott A. MacDonald +1 more |
2001-08-21 |
| 5322765 |
Dry developable photoresist compositions and method for use thereof |
Willard E. Conley, Ranee W. Kwong, Leo L. Linehan, Scott A. MacDonald, Harbans S. Sachdev +2 more |
1994-06-21 |
| 4601969 |
High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution |
Barbara D. Grant, Robert D. Miller, Terry C. Tompkins, Carlton G. Willson |
1986-07-22 |
| 4585310 |
Alignment layer orientation in raster scan thermally addressed smectic liquid crystal displays |
Robert J. Cox, Joseph Feng, Jerry Leff |
1986-04-29 |
| 4522911 |
Deep ultra-violet lithographic resists with diazohomotetramic acid compounds |
Dennis McKean, Robert D. Miller, Terry C. Tompkins, Carlton G. Willson |
1985-06-11 |
| 4397937 |
Positive resist compositions |
Dennis McKean, Robert D. Miller, Terry C. Tompkins, Robert J. Twieg, Carlton G. Willson |
1983-08-09 |
| 4339522 |
Ultra-violet lithographic resist composition and process |
Richard D. Balanson, Barbara D. Grant, Augustus C. Ouano |
1982-07-13 |
| 4284706 |
Lithographic resist composition for a lift-off process |
Barbara D. Grant, Carlton G. Willson |
1981-08-18 |
