| 12387029 |
Computing parasitic values for semiconductor designs |
Akira Fujimura, Donald Oriordan |
2025-08-12 |
| 12372864 |
Methods and systems to determine shapes for semiconductor or flat panel display fabrication |
Akira Fujimura, Donald Oriordan |
2025-07-29 |
| 12340164 |
Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrate |
Akira Fujimura, P. Jeffrey Ungar |
2025-06-24 |
| 12287567 |
Method and system for reticle enhancement technology |
Akira Fujimura, Ajay Baranwal |
2025-04-29 |
| 12248242 |
Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrate |
Akira Fujimura, P. Jeffrey Ungar |
2025-03-11 |
| 12243712 |
Method and system for determining a charged particle beam exposure for a local pattern density |
Akira Fujimura, Harold Robert Zable, Abhishek Shendre, William E. Guthrie, Ryan Pearman |
2025-03-04 |
| 12019973 |
Method for reticle enhancement technology of a design pattern to be manufactured on a substrate |
Akira Fujimura, P. Jeffrey Ungar |
2024-06-25 |
| 11953824 |
Method for reticle enhancement technology of a design pattern to be manufactured on a substrate |
Akira Fujimura, P. Jeffrey Ungar |
2024-04-09 |
| 11921420 |
Method and system for reticle enhancement technology |
Akira Fujimura, Ajay Baranwal |
2024-03-05 |
| 11886166 |
Method and system of reducing charged particle beam write time |
Akira Fujimura, Harold Robert Zable, Abhishek Shendre, William E. Guthrie, Ryan Pearman |
2024-01-30 |
| 11783110 |
Method for reticle enhancement technology of a design pattern to be manufactured on a substrate |
Akira Fujimura, P. Jeffrey Ungar |
2023-10-10 |
| 11756765 |
Method and system for determining a charged particle beam exposure for a local pattern density |
Akira Fujimura, Harold Robert Zable, Abhishek Shendre, William E. Guthrie, Ryan Pearman |
2023-09-12 |
| 11693306 |
Method for reticle enhancement technology of a design pattern to be manufactured on a substrate |
Akira Fujimura, P. Jeffrey Ungar |
2023-07-04 |
| 11604451 |
Method and system of reducing charged particle beam write time |
Akira Fujimura, Harold Robert Zable, Abhishek Shendre, William E. Guthrie, Ryan Pearman |
2023-03-14 |
| 11592802 |
Method and system of reducing charged particle beam write time |
Akira Fujimura, Harold Robert Zable, William E. Guthrie, Ryan Pearman |
2023-02-28 |
| 11062878 |
Method and system for determining a charged particle beam exposure for a local pattern density |
Akira Fujimura, Harold Robert Zable, William E. Guthrie, Ryan Pearman |
2021-07-13 |
| 10884395 |
Method and system of reducing charged particle beam write time |
Akira Fujimura, Harold Robert Zable, William E. Guthrie, Ryan Pearman |
2021-01-05 |
| 10748744 |
Method and system for determining a charged particle beam exposure for a local pattern density |
Akira Fujimura, Harold Robert Zable, William E. Guthrie, Ryan Pearman |
2020-08-18 |