Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12261080 | Method of making a three-dimensional memory device using composite hard masks for formation of deep via openings | Roshan Jayakhar TIRUKKONDA, Senaka Kanakamedala, Raghuveer S. Makala, Rahul Sharangpani, Adarsh Rajashekhar | 2025-03-25 |
| 12250817 | Method of making a three-dimensional memory device using composite hard masks for formation of deep via openings | Katsufumi OKAMOTO | 2025-03-11 |
| 12243776 | Method of making a three-dimensional memory device using composite hard masks for formation of deep via openings | Roshan Jayakhar TIRUKKONDA, Senaka Kanakamedala, Raghuveer S. Makala, Rahul Sharangpani, Adarsh Rajashekhar | 2025-03-04 |
| 12245434 | Method of making a three-dimensional memory device using composite hard masks for formation of deep via openings | Roshan Jayakhar TIRUKKONDA, Senaka Kanakamedala, Raghuveer S. Makala | 2025-03-04 |
| 12010841 | Method of making a three-dimensional memory device using composite hard masks for formation of deep via openings | Senaka Kanakamedala, Rahul Sharangpani, Raghuveer S. Makala, Yao-Sheng Lee | 2024-06-11 |
| 11972954 | Method of making a three-dimensional memory device using composite hard masks for formation of deep via openings | Roshan Jayakhar TIRUKKONDA, Senaka Kanakamedala, Rahul Sharangpani, Raghuveer S. Makala | 2024-04-30 |
| 11621277 | Multilevel memory stack structure with tapered inter-tier joint region and methods of making thereof | Zhixin Cui, Senaka Kanakamedala, Yao-Sheng Lee, Chih-Yu Lee | 2023-04-04 |
| 11515250 | Three dimensional semiconductor device containing composite contact via structures and methods of making the same | Ramy Nashed Bassely Said, Rahul Sharangpani, Senaka Kanakamedala, Raghuveer S. Makala | 2022-11-29 |
| 10460951 | Gas reaction trajectory control through tunable plasma dissociation for wafer by-product distribution and etch feature profile uniformity | Saravanapriyan Sriraman, Alex Paterson | 2019-10-29 |
| 10224221 | Internal plasma grid for semiconductor fabrication | Harmeet Singh, Thorsten Lill, Vahid Vahedi, Alex Paterson, Gowri Kamarthy | 2019-03-05 |
| 9966270 | Gas reaction trajectory control through tunable plasma dissociation for wafer by-product distribution and etch feature profile uniformity | Saravanapriyan Sriraman, Alex Paterson | 2018-05-08 |
| 9633846 | Internal plasma grid applications for semiconductor fabrication | Alex Paterson, Do-Young Kim, Gowri Kamarthy, Helene Del Puppo, Jen-Kan Yu +5 more | 2017-04-25 |
| 9589853 | Method of planarizing an upper surface of a semiconductor substrate in a plasma etch chamber | Gowri Kamarthy, Harmeet Singh, Yoshie Kimura, Meihua Shen, Baosuo Zhou +2 more | 2017-03-07 |
| 9245761 | Internal plasma grid for semiconductor fabrication | Harmeet Singh, Thorsten Lill, Vahid Vahedi, Alex Paterson, Gowri Kamarthy | 2016-01-26 |
| 9230819 | Internal plasma grid applications for semiconductor fabrication in context of ion-ion plasma processing | Alex Paterson, Do-Young Kim, Gowri Kamarthy, Helene Del Puppo, Jen-Kan Yu +5 more | 2016-01-05 |