Issued Patents All Time
Showing 25 most recent of 80 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12366418 | Heat exchanger | Masahiro Ariyama, Ryoichi Kurihara, Takuma Shibata, Satoshi Suzuki, Kenji Yamashita | 2025-07-22 |
| 12024573 | Method for manufacturing polymer and flow-type reaction system for manufacturing polymer | Hideki Matsumoto, Kei HARADA | 2024-07-02 |
| 12017424 | Fitting method and repair method | Yuichi Yui, Akihiro TERASAKA, Yoshifusa Tobata, Koichi Hasegawa, Yasunobu Ishida | 2024-06-25 |
| 11492252 | Method for producing group III-V semiconductor nanoparticle, method for producing group III-V semiconductor quantum dot, and flow reaction system | Hideki Matsumoto | 2022-11-08 |
| 11332551 | Method for manufacturing polymer and flow-type reaction system for manufacturing polymer | Hideki Matsumoto, Kei HARADA | 2022-05-17 |
| 11242414 | Method for manufacturing polymer and flow-type reaction system for manufacturing polymer | Kei HARADA | 2022-02-08 |
| 10947112 | Method of manufacturing semiconductor quantum dot and semiconductor quantum dot | Yuji Yoshida | 2021-03-16 |
| 10900716 | Heat exchanger | Masahiro Ariyama, Shozo Wakamatsu, Tadashi Nishikoba, Kakuei Kunii | 2021-01-26 |
| 10570112 | Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofuranosyl)cytosine, synthetic intermediate of thionucleoside, and method for producing the same | Kouki Nakamura, Satoshi Shimamura, Junichi Imoto, Motomasa TAKAHASHI, Katsuyuki Watanabe +6 more | 2020-02-25 |
| 10234211 | Heat exchanger | Masahiro Ariyama, Tadashi Nishikoba | 2019-03-19 |
| 10228192 | Heat exchanger | Masahiro Ariyama, Shozo Wakamatsu, Tadashi Nishikoba, Kakuei Kunii | 2019-03-12 |
| 10207376 | Heat exchanger | Shozo Wakamatsu, Masahiro Ariyama | 2019-02-19 |
| 10093645 | Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofuranosyl)cytosine, synthetic intermediate of thionucleoside, and method for producing the same | Kouki Nakamura, Satoshi Shimamura, Junichi Imoto, Motomasa TAKAHASHI, Katsuyuki Watanabe +6 more | 2018-10-09 |
| 9475835 | Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofuranosyl) cytosine, synthetic intermediate of thionucleoside, and method for producing the same | Kouki Nakamura, Satoshi Shimamura, Junichi Imoto, Motomasa TAKAHASHI, Katsuyuki Watanabe +6 more | 2016-10-25 |
| 9221865 | Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofuranosyl)cytosine, synthetic intermediate of thionucleoside, and method for producing the same | Kouki Nakamura, Satoshi Shimamura, Junichi Imoto, Motomasa TAKAHASHI, Katsuyuki Watanabe +6 more | 2015-12-29 |
| 9149800 | Method for producing ruthenium catalyst and method for producing alkyl group—or alkenyl group-substituted compound using ruthenium catalyst | Hiroki Miura, Masahiro Nagao, Saburo Hosokawa, Masashi Inoue | 2015-10-06 |
| 9051403 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | — | 2015-06-09 |
| 8921162 | Method for manufacturing electronic component, and electronic apparatus | — | 2014-12-30 |
| 8888229 | Method for forming a layer, method for manufacturing an active matrix substrate, and method for manufacturing a multilayered wiring substrate | Tsuyoshi Shintate, Koichi Mizugaki, Kazuaki Sakurada | 2014-11-18 |
| 8877969 | Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition | — | 2014-11-04 |
| 8836660 | Tactile display and CAD system | Akihito Sano, Yoshihiro Tanaka, Hideo Fujimoto, Eisuke Kajisa | 2014-09-16 |
| 8753801 | Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same | Toshiyuki Saie, Masaomi Makino, Hisamitsu Tomeba, Mitsuji Yoshibayashi | 2014-06-17 |
| 8603733 | Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method | Shinji Tarutani, Hideaki Tsubaki, Kazuyoshi Mizutani, Wataru HOSHINO | 2013-12-10 |
| 8530583 | Thermo- and/or photo-sensitive material and insulator film made thereof | Katsuyuki Watanabe, Keiji Yamamoto | 2013-09-10 |
| 8506853 | Composition for optical materials | Kyohei ARAYAMA, Akiyoshi GOTO | 2013-08-13 |