| 5264328 |
Resist development endpoint detection for X-ray lithography |
Ronald A. DellaGuardia, David E. Seeger |
1993-11-23 |
| 4796069 |
Schottky diode having limited area self-aligned guard ring and method for making same |
Narasipur G. Anantha, Harsaran S. Bhatia, Santosh P. Gaur |
1989-01-03 |
| 4691435 |
Method for making Schottky diode having limited area self-aligned guard ring |
Narasipur G. Anantha, Harsaran S. Bhatia, Santosh P. Gaur |
1987-09-08 |
| 4688069 |
Isolation for high density integrated circuits |
Richard C. Joy, Bernard M. Kemlage |
1987-08-18 |
| 4494004 |
Electron beam system |
Michel S. Michail, Ollie C. Woodard |
1985-01-15 |
| 4454647 |
Isolation for high density integrated circuits |
Richard C. Joy, Bernard M. Kemlage |
1984-06-19 |
| 4454646 |
Isolation for high density integrated circuits |
Richard C. Joy, Bernard M. Kemlage |
1984-06-19 |
| 4447824 |
Planar multi-level metal process with built-in etch stop |
Joseph S. Logan, Laura Rothman, Geraldine C. Schwartz, Charles L. Standley |
1984-05-08 |
| 4389294 |
Method for avoiding residue on a vertical walled mesa |
Narasipur G. Anantha, Harsaran S. Bhatia, Homi G. Sarkary |
1983-06-21 |
| 4367119 |
Planar multi-level metal process with built-in etch stop |
Joseph S. Logan, Laura Rothman, Geraldine C. Schwartz, Charles L. Standley |
1983-01-04 |
| 4222792 |
Planar deep oxide isolation process utilizing resin glass and E-beam exposure |
Reginald F. Lever, Alwin E. Michel, Laura Rothman |
1980-09-16 |
