| 8202394 |
Method of manufacturing semiconductor devices and semiconductor manufacturing apparatus |
Tsuyoshi Moriya, Natsuko Ito |
2012-06-19 |
| 8051799 |
Object-processing apparatus controlling production of particles in electric field or magnetic field |
Yousuke Itagaki, Natsuko Ito |
2011-11-08 |
| 7974067 |
Plasma processing apparatus and method of suppressing abnormal discharge therein |
Natsuko Ito, Mitsuo Yasaka, Yousuke Itagaki |
2011-07-05 |
| 7045465 |
Particle-removing method for a semiconductor device manufacturing apparatus |
Natsuko Ito, Tsuyoshi Moriya |
2006-05-16 |
| 7006682 |
Apparatus for monitoring particles and method of doing the same |
Tsuyoshi Moriya, Natsuko Ito |
2006-02-28 |
| 6737666 |
Apparatus and method for detecting an end point of a cleaning process |
Natsuko Ito, Tsuyoshi Moriya, Yoshinori Kato, Masaru Aomori, Shuji Moriya +1 more |
2004-05-18 |
| 6423176 |
Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles |
Natsuko Ito, Tsuyoshi Moriya |
2002-07-23 |
| 6346425 |
Vapor-phase processing method capable of eliminating particle formation |
Natsuko Ito, Tsuyoshi Moriya, Shuji Moriya, Masaru Aomori, Yoshinori Kato +1 more |
2002-02-12 |
| 6306770 |
Method and apparatus for plasma etching |
Natsuko Ito, Tsuyoshi Moriya |
2001-10-23 |
| 6284049 |
Processing apparatus for fabricating LSI devices |
Natsuko Ito |
2001-09-04 |
| 6184489 |
Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles |
Natsuko Ito, Tsuyoshi Moriya |
2001-02-06 |
| 6115120 |
System and method for detecting particles produced in a process chamber by scattering light |
Tsuyoshi Moriya, Natsuko Ito |
2000-09-05 |
| 6042650 |
Processing apparatus for fabricating LSI with protected beam damper |
Natsuko Ito |
2000-03-28 |
| 5870189 |
Particle monitor and particle-free recessing system with particle monitor |
Natsuko Ito |
1999-02-09 |
| 5861951 |
Particle monitoring instrument |
Natsuko Ito |
1999-01-19 |
| 5393577 |
Method for forming a patterned layer by selective chemical vapor deposition |
Shunji Kishida |
1995-02-28 |
| 4873413 |
Method and apparatus for writing a line on a patterned substrate |
Yukio Morishige |
1989-10-10 |