Issued Patents All Time
Showing 25 most recent of 72 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11978622 | Aqueous and semi-aqueous cleaners for the removal of post-etch residues with tungsten and cobalt compatibility | Lingyan Song, Steven Lippy | 2024-05-07 |
| 11788007 | Method for removing hard masks | Hsing-Chen Wu, Min-Chieh Yang | 2023-10-17 |
| 11781066 | Wet etching composition and method | Youngmin Kim, Michael White, Daniela White, Steven M. Bilodeau | 2023-10-10 |
| 11697767 | Silicon nitride etching composition and method | Steven M. Bilodeau, SeongJin Hong, Hsing-Chen Wu, Min-Chieh Yang | 2023-07-11 |
| 11530356 | Compositions and methods for selectively etching silicon nitride films | Steven M. Bilodeau, Daniela White | 2022-12-20 |
| 11492709 | Method and composition for etching molybdenum | Atanu K. Das, Daniela White, Eric Hong, JeongYeol Yang, Juhee Yeo +5 more | 2022-11-08 |
| 11365351 | Wet etching composition and method | Youngmin Kim, Michael White, Daniela White, Steven M. Bilodeau | 2022-06-21 |
| 11346008 | Ruthenium etching composition and method | Steven Lippy | 2022-05-31 |
| 11164738 | Compositions and methods for removing ceria particles from a surface | Daniela White, Thomas Parson, Michael White, Atanu K. Das | 2021-11-02 |
| 11053440 | Silicon nitride etching composition and method | Steven M. Bilodeau, SeongJin Hong, Hsing-Chen Wu, Min-Chieh Yang | 2021-07-06 |
| 10991809 | Composition and process for selectively etching p-doped polysilicon relative to silicon nitride | Steven M. Bilodeau | 2021-04-27 |
| 10957547 | Formulations to selectively etch silicon germanium relative to germanium | Steven M. Bilodeau | 2021-03-23 |
| 10920141 | Compositions and methods for selectively etching titanium nitride | Li-Min Chen, Steven Lippy, Lingyan Song | 2021-02-16 |
| 10790187 | Post-etch residue removal for advanced node beol processing | Makonnen Payne, WonLae Kim, Eric Hong, Sheng-Hung Tu, Chieh-Ju Wang +1 more | 2020-09-29 |
| 10651045 | Compositions and methods for etching silicon nitride-containing substrates | Steven M. Bilodeau, Wen-Haw Dai, Min-Chieh Yang, Sheng-Hung Tu, Hsing-Chen Wu +2 more | 2020-05-12 |
| 10577567 | Cleaning compositions for removing post etch residue | Makonnen Payne, WonLae Kim, Eric Hong, Sean Kim | 2020-03-03 |
| 10472567 | Compositions and methods for selectively etching titanium nitride | Li-Min Chen, Steven Lippy, Lingyan Song, Chia-Jung Hsu, Sheng-Hung Tu +1 more | 2019-11-12 |
| 10475658 | Formulations to selectively etch silicon and germanium | Steven M. Bilodeau | 2019-11-12 |
| 10460954 | Anti-reflective coating cleaning and post-etch residue removal composition having metal, dielectric and nitride compatibility | Steven Lippy, Lingyan Song | 2019-10-29 |
| 10446389 | Formulations for the removal of particles generated by cerium-containing solutions | Jeffery A. Barnes | 2019-10-15 |
| 10428271 | Compositions and methods for selectively etching titanium nitride | Li-Min Chen, Steven Lippy, Chia-Jung Hsu, Sheng-Hung Tu, Chieh-Ju Wang | 2019-10-01 |
| 10392560 | Compositions and methods for selectively etching titanium nitride | Jeffrey A. Barnes, Li-Min Chen, Steven Lippy, Rekha Rajaram, Sheng-Hung Tu | 2019-08-27 |
| 10347504 | Use of non-oxidizing strong acids for the removal of ion-implanted resist | Steven M. Bilodeau, Jaeseok Lee, WonLae Kim, Jeffrey A. Barnes | 2019-07-09 |
| 10340150 | Ni:NiGe:Ge selective etch formulations and method of using same | Steven M. Bilodeau, Jeffrey A. Barnes, Hsing-Chen Wu, Sheng-Hung Tu, Thomas Parson +1 more | 2019-07-02 |
| 10290505 | Passivation of germanium surfaces | Steven M. Bilodeau, Hsing-Chen Wu, Min-Chieh Yang | 2019-05-14 |