Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8552560 | Alternate pad structures/passivation inegration schemes to reduce or eliminate IMC cracking in post wire bonded dies during Cu/Low-K BEOL processing | Hemanshu Bhatt, Jayanthi Pallinti, Sey-Shing Sun, Hong Ying, Chiyi Kao | 2013-10-08 |
| 8076779 | Reduction of macro level stresses in copper/low-K wafers | Sey-Shing Sun, Jayanthi Pallinti, Hemanshu Bhatt, Hong Ying, Chiyi Kao +1 more | 2011-12-13 |
| 7531442 | Eliminate IMC cracking in post wirebonded dies: macro level stress reduction by modifying dielectric/metal film stack in be layers during Cu/Low-K processing | Jayanthi Pallinti, Hemanshu Bhatt, Sey-Shing Sun, Hong Ying, Chiyi Kao +3 more | 2009-05-12 |
| 7354790 | Method and apparatus for avoiding dicing chip-outs in integrated circuit die | Parthasarathy Rajagopalan, Zafer Kutlu, Emery Sugasawara, Charles E. VONDERACH, Yogendra Ranade +2 more | 2008-04-08 |
| 7205673 | Reduce or eliminate IMC cracking in post wire bonded dies by doping aluminum used in bond pads during Cu/Low-k BEOL processing | Jayanthi Pallinti, Hemanshu Bhatt, Sey-Shing Sun, Hong Ying, Chiyi Kao | 2007-04-17 |
| 6969683 | Method of preventing resist poisoning in dual damascene structures | Rongxiang Hu, Yongbae Kim, Sang-Yun Lee, Hiroaki Takikawa, Shumay X. Dou +5 more | 2005-11-29 |
| 6713386 | Method of preventing resist poisoning in dual damascene structures | Rongxiang Hu, Yongbae Kim, Sang-Yun Lee, Hiroaki Takikawa, Shumay X. Dou +5 more | 2004-03-30 |
| 6139780 | Dynamic random access memories with dielectric compositions stable to reduction | Seshu B. Desu, Carlos A. Suchicital | 2000-10-31 |
| 5807774 | Simple method of fabricating ferroelectric capacitors | Seshu B. Desu, Hemanshu Bhatt | 1998-09-15 |
| 5790366 | High temperature electrode-barriers for ferroelectric and other capacitor structures | Seshu B. Desu, Hemanshu Bhatt, Yoosang Hwang | 1998-08-04 |
| 5496437 | Reactive ion etching of lead zirconate titanate and ruthenium oxide thin films | Seshu B. Desu, Wei Pan | 1996-03-05 |
| 5491102 | Method of forming multilayered electrodes for ferroelectric devices consisting of conductive layers and interlayers formed by chemical reaction | Seshu B. Desu, In-Kyu Yoo, Chi Kong Kwok | 1996-02-13 |