| 10161915 |
In-situ contactless monitoring of photomask pellicle degradation |
Remi Riviere |
2018-12-25 |
| 9798238 |
Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques |
Guo Xiang Ning, Paul Ackmann, Soon Yoeng Tan |
2017-10-24 |
| 9798244 |
Methods, apparatus, and systems for minimizing defectivity in top-coat-free lithography and improving reticle CD uniformity |
Philipp Jaschinsky, Remi Riviere, Wolfram Grundke |
2017-10-24 |
| 9653367 |
Methods including a processing of wafers and spin coating tool |
Torsten Maehr, Martin Freitag |
2017-05-16 |
| 9341961 |
Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques |
Guo Xiang Ning, Paul Ackmann, Soon Yoeng Tan |
2016-05-17 |
| 9091943 |
Asymmetric reticle heating of multilayer reticles eliminated by dummy exposures and related methods |
Matthias Ruhm, Eric Cotte |
2015-07-28 |
| 9075934 |
Reticle defect correction by second exposure |
— |
2015-07-07 |
| 9005882 |
Reticle defect correction by second exposure |
— |
2015-04-14 |
| 8785112 |
Reticle defect correction by second exposure |
— |
2014-07-22 |
| 8681310 |
Mechanical fixture of pellicle to lithographic photomask |
— |
2014-03-25 |
| 8574795 |
Lithographic CD correction by second exposure |
— |
2013-11-05 |
| 8551677 |
Lithographic CD correction by second exposure |
— |
2013-10-08 |
| 8518189 |
Vapor clean for haze and particle removal from lithographic photomasks |
— |
2013-08-27 |
