| 8025731 |
Gas injection system for plasma processing |
Tuqiang Ni |
2011-09-27 |
| 7785417 |
Gas injection system for plasma processing |
Tuqiang Ni |
2010-08-31 |
| 6626185 |
Method of depositing a silicon containing layer on a semiconductor substrate |
Paul Shufflebotham, Michael Barnes, Huong Nguyen, Brian McMillin, Monique Ben-Dor |
2003-09-30 |
| 6268700 |
Vacuum plasma processor having coil with intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil |
John Holland |
2001-07-31 |
| 6230651 |
Gas injection system for plasma processing |
Tuqiang Ni |
2001-05-15 |
| 6184158 |
Inductively coupled plasma CVD |
Paul Shufflebotham, Brian McMillin, Huong Nguyen, Butch Berney, Monique Ben-Dor |
2001-02-06 |
| 6028395 |
Vacuum plasma processor having coil with added conducting segments to its peripheral part |
John Holland |
2000-02-22 |
| 5667631 |
Dry etching of transparent electrodes in a low pressure plasma reactor |
John Holland |
1997-09-16 |
