Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6191016 | Method of patterning a layer for a gate electrode of a MOS transistor | Robert S. Chau, Thomas A. Letson, Patricia Stokley, Ralph A. Schweinfurth | 2001-02-20 |
| 5874358 | Via hole profile and method of fabrication | Alan M. Myers, Thomas A. Letson, Shi-ning Yang, Peng Bai | 1999-02-23 |
| 5619071 | Anchored via connection | Alan M. Myers, Thomas A. Letson, Shi-ning Yang, Peng Bai | 1997-04-08 |
| 5549784 | Method for etching silicon oxide films in a reactive ion etch system to prevent gate oxide damage | Kevin F. Carmody, Gilroy Vandentop | 1996-08-27 |
| 5470790 | Via hole profile and method of fabrication | Alan M. Myers, Thomas A. Letson, Shi-ning Yang, Peng Bai | 1995-11-28 |
| 5262279 | Dry process for stripping photoresist from a polyimide surface | Chi-Hwa Tsang, Robert M. Guptill | 1993-11-16 |
| 5242864 | Polyimide process for protecting integrated circuits | Maxine Fassberg, Melton C. Bost, Krishnamurthy Murali, Lynn A. Price, Robert Lindstedt | 1993-09-07 |
| 5202291 | High CF.sub.4 flow-reactive ion etch for aluminum patterning | Chris Kardas | 1993-04-13 |