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Method of patterning a layer for a gate electrode of a MOS transistor |
Robert S. Chau, Thomas A. Letson, Patricia Stokley, Ralph A. Schweinfurth |
2001-02-20 |
| 5874358 |
Via hole profile and method of fabrication |
Alan M. Myers, Thomas A. Letson, Shi-ning Yang, Peng Bai |
1999-02-23 |
| 5619071 |
Anchored via connection |
Alan M. Myers, Thomas A. Letson, Shi-ning Yang, Peng Bai |
1997-04-08 |
| 5549784 |
Method for etching silicon oxide films in a reactive ion etch system to prevent gate oxide damage |
Kevin F. Carmody, Gilroy Vandentop |
1996-08-27 |
| 5470790 |
Via hole profile and method of fabrication |
Alan M. Myers, Thomas A. Letson, Shi-ning Yang, Peng Bai |
1995-11-28 |
| 5262279 |
Dry process for stripping photoresist from a polyimide surface |
Chi-Hwa Tsang, Robert M. Guptill |
1993-11-16 |
| 5242864 |
Polyimide process for protecting integrated circuits |
Maxine Fassberg, Melton C. Bost, Krishnamurthy Murali, Lynn A. Price, Robert Lindstedt |
1993-09-07 |
| 5202291 |
High CF.sub.4 flow-reactive ion etch for aluminum patterning |
Chris Kardas |
1993-04-13 |