| 8426858 |
Strained NMOS transistor featuring deep carbon doped regions and raised donor doped source and drain |
Michael L. Hattendorf, Jack Hwang, Anand S. Murthy |
2013-04-23 |
| 8344452 |
Metal gate transistors with raised source and drain regions formed on heavily doped substrate |
Nick Lindert, Justin K. Brask |
2013-01-01 |
| 7858981 |
Strained NMOS transistor featuring deep carbon doped regions and raised donor doped source and drain |
Michael L. Hattendorf, Jack Hwang, Anand S. Murthy |
2010-12-28 |
| 7812394 |
CMOS transistor junction regions formed by a CVD etching and deposition sequence |
Anand S. Murthy, Glenn A. Glass, Michael L. Hattendorf, Jeffrey R. Wank |
2010-10-12 |
| 7479432 |
CMOS transistor junction regions formed by a CVD etching and deposition sequence |
Anand S. Murthy, Glenn A. Glass, Michael L. Hattendorf, Jeffrey R. Wank |
2009-01-20 |
| 7479431 |
Strained NMOS transistor featuring deep carbon doped regions and raised donor doped source and drain |
Michael L. Hattendorf, Jack Hwang, Anand S. Murthy |
2009-01-20 |
| 7427775 |
Fabricating strained channel epitaxial source/drain transistors |
Anand S. Murthy, Justin K. Brask, Boyan Boyanov, Nick Lindert |
2008-09-23 |
| 7402872 |
Method for forming an integrated circuit |
Anand S. Murthy, Glenn A. Glass, Michael L. Hattendorf, Tahir Ghani |
2008-07-22 |
| 7332439 |
Metal gate transistors with epitaxial source and drain regions |
Nick Lindert, Justin K. Brask |
2008-02-19 |
| 7226842 |
Fabricating strained channel epitaxial source/drain transistors |
Anand S. Murthy, Justin K. Brask, Boyan Boyanov, Nick Lindert |
2007-06-05 |
| 7195985 |
CMOS transistor junction regions formed by a CVD etching and deposition sequence |
Anand S. Murthy, Glenn A. Glass, Michael L. Hattendorf, Jeffrey R. Wank |
2007-03-27 |