Issued Patents All Time
Showing 26–39 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7927968 | Dual stress STI | Deok-kee Kim, Seong-Dong Kim | 2011-04-19 |
| 7902082 | Method of forming field effect transistors using diluted hydrofluoric acid to remove sacrificial nitride spacers | Sang-Jine Park, Richard O. Henry, Yong Siang Tan, O Sung Kwon | 2011-03-08 |
| 7863201 | Methods of forming field effect transistors having silicided source/drain contacts with low contact resistance | Yong-Kuk Jeong, Bong Seok Suh, Dong-Hee Yu, Seong-Dong Kim, O Sung Kwon | 2011-01-04 |
| 7737468 | Semiconductor devices having recesses filled with semiconductor materials | Jin-Ping Han, Henry K. Utomo, O Sung Kwon, Judson R. Holt, Thomas N. Adam | 2010-06-15 |
| 7670901 | Method of fabricating a bottle trench and a bottle trench capacitor | Kenneth T. Settlemyer, Jr., Ravikumar Ramachandran, Min Soo Kim | 2010-03-02 |
| 7564086 | Self-aligned, silicided, trench-based DRAM/eDRAM processes with improved retention | Kim Bosang, Herbert L. Ho, Ali Babar Khan, Deok-kee Kim | 2009-07-21 |
| 7521763 | Dual stress STI | Deok-kee Kim, Seong-Dong Kim | 2009-04-21 |
| 7387930 | Method of fabricating a bottle trench and a bottle trench capacitor | Kenneth T. Settlemyer, Jr., Ravikumar Ramachandran, Min Soo Kim | 2008-06-17 |
| 7288821 | Structure and method of three dimensional hybrid orientation technology | — | 2007-10-30 |
| 7153737 | Self-aligned, silicided, trench-based, DRAM/EDRAM processes with improved retention | Kim Bosang, Herbert L. Ho, Babar A. Khan, Deok-kee Kim | 2006-12-26 |
| 7122439 | Method of fabricating a bottle trench and a bottle trench capacitor | Kenneth T. Settlemyer, Jr., Ravikumar Ramachandran, Min Soo Kim | 2006-10-17 |
| 7030012 | Method for manufacturing tungsten/polysilicon word line structure in vertical DRAM | Ramachandra Divakaruni, Oleg Gluschenkov, Rajeev Malik | 2006-04-18 |
| 6884715 | Method for forming a self-aligned contact with a silicide or damascene conductor and the structure formed thereby | Kangguo Cheng, Deok-kee Kim, Carl Radens | 2005-04-26 |
| 5801538 | Test pattern group and a method of measuring an insulation film thickness utilizing the same | — | 1998-09-01 |