Issued Patents All Time
Showing 76–100 of 102 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6395397 | Organic anti-reflective coating polymer and preparation thereof | Sung-Eun Hong, Ki Ho Baik | 2002-05-28 |
| 6391518 | Polymers and photoresist compositions using the same | Jae Chang Jung, Geun Su Lee, Ki Ho Baik | 2002-05-21 |
| 6388039 | Organic anti-reflective polymer and method for manufacturing thereof | Sung-Eun Hong, Ki Ho Baik | 2002-05-14 |
| 6376632 | Photoresist polymers of carboxyl-containing alicyclic compounds | Geun Su Lee, Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik | 2002-04-23 |
| 6372935 | Copolymer resin, preparation thereof, and photoresist using the same | Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik | 2002-04-16 |
| 6369181 | Copolymer resin, preparation thereof, and photoresist using the same | Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik | 2002-04-09 |
| 6368770 | Photoresist monomers, polymers thereof, and photoresist compositions containing the same | Jae Chang Jung, Geun Su Lee, Ki Ho Baik | 2002-04-09 |
| 6368768 | Organic anti-reflective coating material and its preparation | Sung-Eun Hong, Ki Ho Baik | 2002-04-09 |
| 6359153 | Photoresist monomers and preparation thereof | Geun Su Lee, Chang-Il Choi, Hyeong Soo Kim, Jin-Soo Kim, Jae Chang Jung +1 more | 2002-03-19 |
| 6350818 | Anti reflective coating polymers and the preparation method thereof | Sung-Eun Hong, Hyeong Soo Kim, Ki Ho Baik | 2002-02-26 |
| 6348296 | Copolymer resin, preparation thereof, and photoresist using the same | Cha-Won Koh, Hyung Gi Kim | 2002-02-19 |
| 6316162 | Polymer and a forming method of a micro pattern using the same | Jae Chang Jung, Myoung Soo Kim, Hyung Gi Kim, Chi Hyeong Roh, Geun Su Lee +2 more | 2001-11-13 |
| 6312865 | Semiconductor device using polymer-containing photoresist, and process for manufacturing the same | Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik | 2001-11-06 |
| 6309790 | Organic anti-reflective coating material and its preparation | Sung-Eun Hong, Ki Ho Baik | 2001-10-30 |
| 6291131 | Monomers for photoresist, polymers thereof, and photoresist compositions using the same | Jae Chang Jung, Chi Hyeong Roh, Keun Kyu Kong, Geun Su Lee, Ki Ho Baik | 2001-09-18 |
| 6265130 | Photoresist polymers of carboxyl-containing alicyclic compounds | Geun Su Lee, Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik | 2001-07-24 |
| 6262222 | Copolymers containing N-vinyllactam derivatives, preparation methods thereof and photoresists therefrom | Jin Baek Kim, Jong Ho Cheong | 2001-07-17 |
| 6248847 | Copolymer resin, preparation thereof, and photoresist using the same | Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik | 2001-06-19 |
| 6235448 | Photoresist monomers, polymers thereof, and photoresist compositions containing the same | Geun Su Lee, Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik | 2001-05-22 |
| 6235447 | Photoresist monomers, polymers thereof, and photoresist compositions containing the same | Geun Su Lee, Cha-Won Koh, Jae Chang Jung, Ki Ho Baik | 2001-05-22 |
| 6225020 | Polymer and a forming method of a micro pattern using the same | Jae Chang Jung, Myoung Soo Kim, Hyung Gi Kim, Chi Hyeong Roh, Geun Su Lee +2 more | 2001-05-01 |
| 6200731 | Photoresist cross-linking monomers, photoresist polymers and photoresist compositions comprising the same | Geun Su Lee, Cha-Won Koh, Jae Chang Jung, Ki Ho Baik | 2001-03-13 |
| 6150069 | Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same | Jae Chang Jung, Chi Hyeong Roh, Geun Su Lee, Ki Ho Baik | 2000-11-21 |
| 6132936 | Monomer and polymer for photoresist, and photoresist using the same | — | 2000-10-17 |
| 6051678 | Copolymers containing N-vinyllactam derivatives, preparation methods thereof and photoresists therefrom | Jin Baek Kim, Jong Ho Cheong | 2000-04-18 |