Issued Patents All Time
Showing 51–75 of 102 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6627383 | Photoresist monomer comprising bisphenol derivatives and polymers thereof | Geun Su Lee, Jae Chang Jung, Ki Ho Baik | 2003-09-30 |
| 6610616 | Method for forming micro-pattern of semiconductor device | Cha-Won Koh, Sung-Eun Hong, Jin-Soo Kim, Geun Su Lee, Jae Chang Jung | 2003-08-26 |
| 6608158 | Copolymer resin, preparation thereof, and photoresist using the same | Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik | 2003-08-19 |
| 6602650 | Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof | Sung-Eun Hong, Jae Chang Jung, Geun Su Lee, Ki Ho Baik | 2003-08-05 |
| 6599678 | Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof | Sung-Eun Hong, Jae Chang Jung, Geun Su Lee, Ki Ho Baik | 2003-07-29 |
| 6593446 | Organic polymer for organic anti-reflective coating layer and preparation thereof | Jae Chang Jung, Keun Kyu Kong, Sung-Eun Hong, Geun Su Lee, Ki Ho Baik | 2003-07-15 |
| 6589707 | Partially crosslinked polymer for bilayer photoresist | Geun Su Lee, Jae Chang Jung, Ki Ho Baik | 2003-07-08 |
| 6586619 | Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same | Geun Su Lee, Cha-Won Koh, Jae Chang Jung, Ki Ho Baik | 2003-07-01 |
| 6582883 | Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof | Sung-Eun Hong, Jae Chang Jung, Geun Su Lee, Ki Ho Baik | 2003-06-24 |
| 6569599 | Partially crosslinked polymer for bilayer photoresist | Geun Su Lee, Jae Chang Jung, Ki Ho Baik | 2003-05-27 |
| 6562925 | Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof | Sung-Eun Hong, Jae Chang Jung, Geun Su Lee, Ki Ho Baik | 2003-05-13 |
| 6548613 | Organic anti-reflective coating polymer and preparation thereof | Sung-Eun Hong, Jae Chang Jung, Geun Su Lee, Ki Ho Baik | 2003-04-15 |
| 6538090 | Organic anti-reflective polymer and method for manufacturing thereof | Sung-Eun Hong, Ki Ho Baik | 2003-03-25 |
| 6531562 | Photoresist monomer, polymer thereof and photoresist composition containing it | Jae Chang Jung, Geun Su Lee, Ki Ho Baik | 2003-03-11 |
| 6492441 | Anti reflective coating polymers and the preparation method thereof | Sung-Eun Hong, Hyeong Soo Kim, Ki Ho Baik | 2002-12-10 |
| 6489432 | Organic anti-reflective coating polymer and preparation thereof | Sung-Eun Hong, Jae Chang Jung, Geun Su Lee, Ki Ho Baik | 2002-12-03 |
| 6489423 | Organic anti-reflective polymer and method for manufacturing thereof | Sung-Eun Hong, Ki Ho Baik | 2002-12-03 |
| 6486283 | Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof | Sung-Eun Hong, Jae Chang Jung, Geun Su Lee, Ki Ho Baik | 2002-11-26 |
| 6465147 | Cross-linker for photoresist, and process for forming a photoresist pattern using the same | Geun Su Lee, Jae Chang Jung, Ki Ho Baik | 2002-10-15 |
| 6448352 | Photoresist monomer, polymer thereof and photoresist composition containing it | Jae Chang Jung, Geun Su Lee, Ki Ho Baik | 2002-09-10 |
| 6426171 | Photoresist monomer, polymer thereof and photoresist composition containing it | Jae Chang Jung, Geun Su Lee, Ki Ho Baik | 2002-07-30 |
| 6423797 | Anti-reflective coating polymers from p-tosylmethylacrylamide and preparation method | Sung-Eun Hong, Ki Ho Baik | 2002-07-23 |
| 6416926 | Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same | Jae Chang Jung, Chi Hyeong Roh, Geun Su Lee, Ki Ho Baik | 2002-07-09 |
| 6410670 | Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same | Geun Su Lee, Cha-Won Koh, Jae Chang Jung, Ki Ho Baik | 2002-06-25 |
| 6399272 | Phenylenediamine derivative-type additive useful for a chemically amplified photoresist | Geun Su Lee, Cha-Won Koh, Jae Chang Jung, Ki Ho Baik | 2002-06-04 |