Issued Patents All Time
Showing 26–34 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6225011 | Method for manufacturing semiconductor devices utilizing plurality of exposure systems | Yasuko Gotoh, Norio Hasegawa, Naoko Asai, Takashi Matsuzaka, Katsuhiro Kawasaki | 2001-05-01 |
| 6087074 | Photomask and pattern forming method employing the same | Norio Hasegawa, Fumio Murai | 2000-07-11 |
| 6013398 | Photomask and pattern forming method employing the same | Norio Hasegawa, Fumio Murai | 2000-01-11 |
| 5895741 | Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system | Norio Hasegawa, Tsuneo Terasawa, Hiroshi Fukuda, Akira Imai, Akemi Moniwa +1 more | 1999-04-20 |
| 5851703 | Photomask and pattern forming method employing the same | Norio Hasegawa, Fumio Murai | 1998-12-22 |
| 5700601 | Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system | Norio Hasegawa, Tsuneo Terasawa, Hiroshi Fukuda, Akira Imai, Akemi Moniwa +1 more | 1997-12-23 |
| 5656400 | Photomask and pattern forming method employing the same | Norio Hasegawa, Fumio Murai | 1997-08-12 |
| 5578421 | Photomask and pattern forming method employing the same | Norio Hasegawa, Fumio Murai | 1996-11-26 |
| 5429896 | Photomask and pattern forming method employing the same | Norio Hasegawa, Fumio Murai | 1995-07-04 |