Issued Patents All Time
Showing 26–38 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5324550 | Pattern forming method | Hidenori Yamaguchi, Fumio Murai, Norio Hasegawa, Toshio Sakamizu | 1994-06-28 |
| 5178663 | 3-alkoxyalkanoic acid derivative, process for preparing the same and herbicide using the same | Katsumasa Harada, Takaaki Abe, Yuji Akiyoshi, Kaoru Yamamoto | 1993-01-12 |
| 5118582 | Pattern forming material and process for forming pattern using the same | Takumi Ueno, Nobuaki Hayashi, Emiko Fukuma, Keiko Tadano | 1992-06-02 |
| 4958057 | Transfer-type plasma torch with ring-shaped cathode and with processing gas passage provide interiorly of the cathode | Nobuo Tajima, Tsuyoshi Shinoda, Nobuyoshi Hirotsu | 1990-09-18 |
| 4956052 | Process for separation using supercritical fluid | Mitsuho Hirata, Takeshi Ishikawa | 1990-09-11 |
| 4835089 | Resist pattern forming process with dry etching | Takao Iwayanagi, Norio Hasegawa, Toshihiko Tanaka, Takumi Ueno, Michiaki Hashimoto +2 more | 1989-05-30 |
| 4792516 | Photosensitive composition | Minoru Toriumi, Ryotaro Irie, Shigeru Koibuchi | 1988-12-20 |
| 4722881 | Radiation-sensitive resist composition with an admixture of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane and a polysilsesquioxane | Takumi Ueno, Takashi Nishida, Nobuaki Hayashi | 1988-02-02 |
| 4513077 | Electron beam or X-ray reactive image-formable resinous composition | Asao Isobe, Daisuke Makino | 1985-04-23 |
| 4465768 | Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate | Takumi Ueno, Takao Iwayanagi, Takahiro Kohashi, Saburo Nonogaki | 1984-08-14 |
| 4409317 | Radiation sensitive coating composition | — | 1983-10-11 |
| 4401830 | Process for preparation of 3-alkoxy-4-hydroxyphenylacetic acid | Sumio Umumura, Fumio Iwata, Kikuo Ataka | 1983-08-30 |
| 4339861 | Continuous working process of steel bars for reinforced concrete and apparatus therefor | Shigeru Moriguchi | 1982-07-20 |