Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10759937 | Polyketone composition including epoxy compound, cured polyketone, optical element, and image display device | Nanako Mizuguchi, Satoshi Asaka, Misao Inaba, Yohei Ishikawa, Keiko KUDOH +1 more | 2020-09-01 |
| 10351670 | Aromatic polyketone, method of producing the same, aromatic polyketone composition, aromatic polyketone film, optical element, and image display apparatus | Nanako Mizuguchi, Satoshi Asaka, Misao Inaba, Katsuya Maeyama | 2019-07-16 |
| 10173242 | Method of manufacturing aromatic polyketone film, aromatic polyketone film, substrate provided with aromatic polyketone film, optical element, and image display device | Nanako Mizuguchi, Katsuya Maeyama | 2019-01-08 |
| 10175577 | Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component | Shingo Tahara, Shigeki Katogi, Kouichi Abe, Akitoshi Tanimoto, Yu Aoki | 2019-01-08 |
| 9786576 | Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device | Takumi Ueno, Alexandre Nicolas, Ken Nanaumi | 2017-10-10 |
| 9633848 | Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic device | Yu Aoki, Shigeru Nobe, Kei Kasuya, Akitoshi Tanimoto, Shingo Tahara | 2017-04-25 |
| 9395626 | Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component | Akitoshi Tanimoto, Shigeru Nobe, Kei Kasuya, Shigeki Katogi, Yu Aoki +1 more | 2016-07-19 |
| 8836089 | Positive photosensitive resin composition, method of creating resist pattern, and electronic component | Akitoshi Tanimoto, Shigeru Nobe, Kei Kasuya, Takumi Ueno, Yu Aoki +1 more | 2014-09-16 |
| 8461699 | Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device | Takumi Ueno, Alexandre Nicolas, Yukihiko Yamashita, Ken Nanaumi, Akitoshi Tanimoto | 2013-06-11 |
| 8426985 | Positive-type photosensitive resin composition, method for producing resist pattern, and electronic component | Takumi Ueno, Alexandre Nicolas, Ken Nanaumi | 2013-04-23 |
| 8362199 | Borazine-based resin, process for its production, borazine-based resin composition, insulating film and method for its formation | Makoto Kaji, Koichi Abe, Yuko Uchimaru | 2013-01-29 |
| 7638254 | Positive photosensitive resin composition, method for forming pattern, and electronic part | Takashi Hattori, Yasuharu Murakami, Masayuki Ooe, Hajime Nakano | 2009-12-29 |
| 7625642 | Borazine-based resin, and method for production thereof, borazine based resin composition, insulating coating and method for formation thereof, and electronic parts having the insulating coating | Makoto Kaji, Koichi Abe, Yuko Uchimaru | 2009-12-01 |
| 7504471 | Sulfur-containing phenolic resin, process for preparing the same, phenol derivatives having thioether structure or disulfide structure, process for preparing the same and epoxy resin composition and adhesive | Haruaki Sue, Takashi Kumaki, Hideyasu Tsuiki, Toshihiko Takasaki, Iwao Fukuchi | 2009-03-17 |
| 7491789 | Disulfide-containing phenolic resin as curing agent for epoxy resin | Haruaki Sue, Takashi Kumaki, Hideyasu Tsuiki, Toshihiko Takasaki, Iwao Fukuchi | 2009-02-17 |
| 7435525 | Positive photosensitive resin composition, method for forming pattern, and electronic part | Takashi Hattori, Yasuharu Murakami, Masayuki Ooe, Hajime Nakano | 2008-10-14 |
| 6238628 | Photolytic device for breakdown of organic chlorine compounds | — | 2001-05-29 |