Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9134608 | Positive photosensitive resin composition, method for producing patterned cured film and electronic component | Masashi Kotani, Taku Konno, Tomonori Minegishi, Keishi ONO | 2015-09-15 |
| 8852726 | Photosensitive polymer composition, method of producing pattern and electronic parts | Hiroshi Komatsu, Yoshiko Tsumaru, Dai Kawasaki, Kouji Katou, Takumi Ueno | 2014-10-07 |
| 8304149 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | Masataka Nunomura, Hajime Nakano, Yoshiko Tsumaru, Takumi Ueno | 2012-11-06 |
| 8231959 | Photosensitive polymer composition, method of producing pattern and electronic parts | Hiroshi Komatsu, Yoshiko Tsumaru, Dai Kawasaki, Kouji Katou, Takumi Ueno | 2012-07-31 |
| 7851128 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | Masataka Nunomura, Hajime Nakano, Yoshiko Tsumaru, Takumi Ueno | 2010-12-14 |
| 7638254 | Positive photosensitive resin composition, method for forming pattern, and electronic part | Takashi Hattori, Yasuharu Murakami, Hiroshi Matsutani, Hajime Nakano | 2009-12-29 |
| 7435525 | Positive photosensitive resin composition, method for forming pattern, and electronic part | Takashi Hattori, Yasuharu Murakami, Hiroshi Matsutani, Hajime Nakano | 2008-10-14 |
| 7150947 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | Masataka Nunomura, Hajime Nakano, Yoshiko Tsumaru, Takumi Ueno | 2006-12-19 |