MN

Masataka Nunomura

HM Hitachi Chemical Dupont Microsystems: 7 patents #4 of 47Top 9%
HC Hitachi Chemical Company: 4 patents #392 of 1,946Top 25%
Overall (All Time): #467,145 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
8304149 Photosensitive polymer composition, method of forming relief patterns, and electronic equipment Masayuki Ooe, Hajime Nakano, Yoshiko Tsumaru, Takumi Ueno 2012-11-06
7851128 Photosensitive polymer composition, method of forming relief patterns, and electronic equipment Masayuki Ooe, Hajime Nakano, Yoshiko Tsumaru, Takumi Ueno 2010-12-14
7153631 Pattern-forming process using photosensitive resin composition Hideo Hagiwara, Makoto Kaji 2006-12-26
7150947 Photosensitive polymer composition, method of forming relief patterns, and electronic equipment Masayuki Ooe, Hajime Nakano, Yoshiko Tsumaru, Takumi Ueno 2006-12-19
6514658 Photosensitive polymer composition, method for forming relief patterns, and electronic parts Masayuki Ohe 2003-02-04
6365306 Photosensitive polymer composition, method for forming relief patterns, and electronic parts Noriyuki Yamazaki 2002-04-02
6329110 Photosensitive polymer composition, method for forming relief patterns, and electronic parts Masayuki Ohe 2001-12-11
6232032 Photosensitive polymer composition, method for forming relief patterns, and electronic parts Noriyuki Yamazaki 2001-05-15
6194126 Pattern-forming process using photosensitive resin composition Hideo Hagiwara, Makoto Kaji 2001-02-27
5856059 Photosensitive resin composition Hideo Hagiwara, Makoto Kaji 1999-01-05
5811218 Photoinitiator compositions including amino acids, coumarin and titanocene and photosensitive materials using the same Makoto Kaji, Yasunori Kojima, Shigeki Katogi, Hideo Hagiwara, Dai Kawasaki +3 more 1998-09-22