Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12386256 | Photosensitive resin composition, method for producing patterned cured film, cured film, interlayer insulating film, cover coat layer, surface protective film, and electronic component | Atsutaro YOSHIZAWA, Satoshi Yoneda, Akira Asada, Tetsuya Enomoto | 2025-08-12 |
| 10725379 | Polymide precursor resin composition | Keishi ONO, Tetsuya Enomoto, Keiko Suzuki, Kazuya Soejima, Etsuharu Suzuki | 2020-07-28 |
| 9751984 | Polyimide precursor, photosensitive resin composition containing said polyimide precursor, and cured-pattern-film manufacturing method and semiconductor device using said photosensitive resin composition | Tetsuya Enomoto, Keishi ONO, Keiko Suzuki, Kazuya Soejima, Etsuharu Suzuki | 2017-09-05 |
| 8420291 | Positive photosensitive resin composition, method for forming pattern, electronic component | Tomonori Minegishi, Tomoko Kawamura, Yuki Nakamura | 2013-04-16 |
| 6514658 | Photosensitive polymer composition, method for forming relief patterns, and electronic parts | Masataka Nunomura | 2003-02-04 |
| 6329110 | Photosensitive polymer composition, method for forming relief patterns, and electronic parts | Masataka Nunomura | 2001-12-11 |