Issued Patents All Time
Showing 1–25 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11766843 | Printing unit, printing device, box making machine | Norifumi Tasaka, Shuichi Takemoto, Toshiaki Miyakura, Eikichi Tanaka | 2023-09-26 |
| 10239275 | Corrugated fiberboard printing device and box-making machine having the same | Kazuya Sugimoto, Makoto SHIMOHATSUBO, Kunihiko YAMAMURO, Takao HISAYUKI | 2019-03-26 |
| 8870361 | Printing device, printing method, sheet-fed printing press, and rotary printing press | Norifumi Tasaka, Shuichi Takemoto, Fumihide Kimura | 2014-10-28 |
| 8696108 | Printing press | Hideaki Sakurai, Shoichi Aoki, Norifumi Tasaka | 2014-04-15 |
| 8365660 | Printing press and printing method | Norifumi Tasaka, Takahide Toshito, Koji Nishiyama | 2013-02-05 |
| 8362199 | Borazine-based resin, process for its production, borazine-based resin composition, insulating film and method for its formation | Hiroshi Matsutani, Koichi Abe, Yuko Uchimaru | 2013-01-29 |
| 8288079 | Photocurable resin composition and a method for forming a pattern | Masahiko Ogino, Hanako Yori | 2012-10-16 |
| 7935472 | Photo-curable resin composition and a method for forming a pattern using the same | Masahiko Ogino, Ken Sawabe, Hanako Yori | 2011-05-03 |
| 7625642 | Borazine-based resin, and method for production thereof, borazine based resin composition, insulating coating and method for formation thereof, and electronic parts having the insulating coating | Hiroshi Matsutani, Koichi Abe, Yuko Uchimaru | 2009-12-01 |
| 7622243 | Photosensitive element, resist pattern formation method and printed wiring board production method | Takashi Kumaki, Masahiro Miyasaka, Yasuhisa Ichihashi, Toshiki Ito | 2009-11-24 |
| 7153631 | Pattern-forming process using photosensitive resin composition | Hideo Hagiwara, Masataka Nunomura | 2006-12-26 |
| 6773866 | Photosensitive resin composition, patterning method, and electronic components | Akihiro Sasaki, Noriyoshi Arai, Toshiki Hagiwara, Brian C. Auman | 2004-08-10 |
| 6600053 | Method of preparing photosensitive resin composition | Noriyoshi Arai, Akihiro Sasaki, Toshiki Hagiwara | 2003-07-29 |
| 6524770 | Hexaaryl biimidazole compounds as photoinitiators, photosensitive composition and method of manufacturing patterns using the compounds | Takahiro Hidaka | 2003-02-25 |
| 6436593 | Positive photosensitive resin composition, process for producing pattern and electronic parts | Tomonori Minegishi | 2002-08-20 |
| 6342333 | Photosensitive resin composition, patterning method, and electronic components | Akihiro Sasaki, Noriyoshi Arai, Toshiki Hagiwara, Brian C. Auman | 2002-01-29 |
| 6329494 | Photosensitive resin composition | Noriyoshi Arai, Akihiro Sasaki, Toshiki Hagiwara | 2001-12-11 |
| 6319656 | Photosensitive polyimide precursor and its use for pattern formation | Haruhiko Kikkawa, Fumio Kataoka, Issei Takemoto, Jun Tanaka, Keiko Isoda +2 more | 2001-11-20 |
| 6309791 | Polyimide precursor, polyimide and their use | Hideo Hagiwara, Yasunori Kojima, Mitsumasa Kojima, Haruhiko Kikkawa | 2001-10-30 |
| 6197475 | Positive type photosensitive resin composition containing an alkali-soluble polymer and a compound which forms an amine compound with irradiation of light | Hideo Hagiwara, Yasunori Kojima | 2001-03-06 |
| 6194126 | Pattern-forming process using photosensitive resin composition | Hideo Hagiwara, Masataka Nunomura | 2001-02-27 |
| 6143475 | Polyimide precursor, polyimide and their use | Hideo Hagiwara, Yasunori Kojima, Mitsumasa Kojima, Haruhiko Kikkawa | 2000-11-07 |
| 6071667 | Photosensitive resin composition containing a photosensitive polyamide resin | Hideo Hagiwara, Yasunori Kojima, Mitsumasa Kojima, Haruhiko Kikkawa | 2000-06-06 |
| 6025113 | Photosensitve polymide precursor and its use for pattern formation | Haruhiko Kikkawa, Fumio Kataoka, Issei Takemoto, Jun Tanaka, Keiko Isoda +2 more | 2000-02-15 |
| 5889141 | Photoimageable compositions comprising polyquinoline polymer and diazo compound | Matthew L. Marrocco, III | 1999-03-30 |