MK

Mitsumasa Kojima

HC Hitachi Chemical Company: 9 patents #162 of 1,946Top 9%
HI Hitachi: 1 patents #17,742 of 28,497Top 65%
Overall (All Time): #589,005 of 4,157,543Top 15%
9
Patents All Time

Issued Patents All Time

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
6309791 Polyimide precursor, polyimide and their use Hideo Hagiwara, Yasunori Kojima, Makoto Kaji, Haruhiko Kikkawa 2001-10-30
6143475 Polyimide precursor, polyimide and their use Hideo Hagiwara, Yasunori Kojima, Makoto Kaji, Haruhiko Kikkawa 2000-11-07
6071667 Photosensitive resin composition containing a photosensitive polyamide resin Hideo Hagiwara, Yasunori Kojima, Makoto Kaji, Haruhiko Kikkawa 2000-06-06
5811218 Photoinitiator compositions including amino acids, coumarin and titanocene and photosensitive materials using the same Makoto Kaji, Yasunori Kojima, Shigeki Katogi, Masataka Nunomura, Hideo Hagiwara +3 more 1998-09-22
5262277 Photosensitive resin composition and photosensitive element using the same Kuniaki Sato, Yasunori Kojima, Shigeo Tachiki, Tohru Kikuchi, Toshiaki Ishimaru +1 more 1993-11-16
5115089 Processes for preparation of polyimide-isoindroquinazolinedione and precursor thereof Masatoshi Yoshida, Katsuji Shibata, Hidetaka Satou, Toshihiko Kato, Yasuo Miyadera +1 more 1992-05-19
4958001 Dicyclohexyl-3,4,3',4'-tetracarboxylic acid or dianhydride thereof and polyamide-acid and polyimide obtained therefrom Tohru Kikuchi, Toshiyuki Fujita, Takayuki Saito, Hidetaka Sato, Hiroshi Suzuki 1990-09-18
4847358 Process for producing polyamide acid having siloxane bonds and polyimide having siloxane bonds and isoindoloquinazolinedione rings Takayuki Saito, Toul Kikuchi, Shun-ichiro Uchimura, Hidetaka Satou, Daisuke Makino 1989-07-11
4565767 Light-sensitive polymer composition with poly(amic acid), bisazide, and tertiary amine compound Fumio Kataoka, Fusaji Shoji, Isao Obara, Issei Takemoto, Hitoshi Yokono +1 more 1986-01-21