Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12043764 | Cationic electrodeposition coating composition and method for electrodeposition coating | Makoto Yasuhara, Mutsumi OGASAWARA | 2024-07-23 |
| 11834968 | Steam generation apparatus and exhaust gas heat recovery plant | Hideyuki Uechi, Yuichi Otani, Fumito Kajitani, Taichi YOSHII, Norito Katsuki +1 more | 2023-12-05 |
| 11578236 | Slurry, polishing-liquid set, polishing liquid, and polishing method for base | Hisataka Minami, Tomohiro Iwano, Keita ARAKAWA | 2023-02-14 |
| 11519426 | Pressurizing device, carbon dioxide cycle plant, and combined cycle plant | Hideyuki Uechi, Tatsuo Ishiguro, Norito Katsuki, Teppei Hata, Takahiro Yamana +2 more | 2022-12-06 |
| 10752807 | Slurry, polishing-liquid set, polishing liquid, method for polishing substrate, and substrate | Hisataka Minami, Tomohiro Iwano, Keita ARAKAWA | 2020-08-25 |
| 9528006 | Coating composition for undercoating | Yusuke Obu, Kashiko Kawai, Tomohiro Miyai, Shunya Nangou, Hideki Masuda | 2016-12-27 |
| 9266309 | Method of producing gas-barrier laminated member | Yusuke Obu, Kashiko Kawai, Tomohiro Miyai, Hideki Masuda | 2016-02-23 |
| 8211519 | Composition for forming gas-barrier material, gas-barrier material, a method of producing the same, and gas-barrier packing material | Yusuke Obu, Hiroshi Sasaki, Kashiko Kawai, Hideki Masuda, Hideki Matsuda +2 more | 2012-07-03 |
| 7309559 | Resist pattern, process for producing same, and utilization thereof | Michiko Natori | 2007-12-18 |
| 7232647 | Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board | Yasuhara Murakami | 2007-06-19 |
| 7220533 | Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, and method for producing printed wiring board | Yasuharu Murakami | 2007-05-22 |
| 6524770 | Hexaaryl biimidazole compounds as photoinitiators, photosensitive composition and method of manufacturing patterns using the compounds | Makoto Kaji | 2003-02-25 |
| 5091535 | Organic photochromic compound, a dimer of pyrido quinoline | Shigeru Nomura | 1992-02-25 |