MK

Makoto Kaji

HC Hitachi Chemical Company: 28 patents #10 of 1,946Top 1%
HM Hitachi Chemical Dupont Microsystems: 5 patents #7 of 47Top 15%
MS Mitsubishi Heavy Industries Machinery Systems: 2 patents #49 of 158Top 35%
📍 Mihara, ND: #1 of 1 inventorsTop 100%
Overall (All Time): #82,443 of 4,157,543Top 2%
39
Patents All Time

Issued Patents All Time

Showing 26–39 of 39 patents

Patent #TitleCo-InventorsDate
5856059 Photosensitive resin composition Hideo Hagiwara, Masataka Nunomura 1999-01-05
5847071 Photosensitive resin composition Hideo Hagiwara, Hiroshi Nishizawa, Kenji Suzuki, Yasunori Kojima 1998-12-08
5811218 Photoinitiator compositions including amino acids, coumarin and titanocene and photosensitive materials using the same Yasunori Kojima, Shigeki Katogi, Masataka Nunomura, Hideo Hagiwara, Dai Kawasaki +3 more 1998-09-22
5668248 Photosensitive resin composition Hideo Hagiwara, Hiroshi Nishizawa, Kenji Suzuki, Yasunori Kojima 1997-09-16
5472823 Photosensitive resin composition Hideo Hagiwara, Hiroshi Nishizawa, Kenji Suzuki, Yasunori Kojima 1995-12-05
5467421 Nonlinear optical material and devices utilizing said material Chie Odoi, Masaichi Sagawa, Hiroyuki Kagawa, Atsushi Kakuta, Kikujiro Ishii +2 more 1995-11-14
5443758 Non-linear optical material containing steroidal ketone compound 1995-08-22
5302725 Aryl triflate compounds and radiologically acid producing agents thereof S. Peter Pappas 1994-04-12
5262090 16-benzalandrosta-1,4-diene-3,17-dione compounds and non-linear optical material 1993-11-16
5219496 Non-linear optical material and non-linear optical devices 1993-06-15
5198402 Aryl triflate compound, radiologically acid producing agent, radiologically acid producing agent system, and radiosensitive composition S. Peter Pappas 1993-03-30
5153236 Photopolymerizable composition Futami Kaneko, Nobuyuki Hayashi 1992-10-06
5034429 Photopolymerizable composition Nobuyuki Hayashi, Futami Kaneko 1991-07-23
4987057 Photoinitiator and photopolymerizable composition using the same Nobuyuki Hayashi 1991-01-22