Issued Patents All Time
Showing 51–63 of 63 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8535551 | Plasma etching method | Takefumi Suzuki, Masahiro Nakamura | 2013-09-17 |
| 8318991 | Method for producing hydrogen-containing fluoroolefin compound | Takefumi Suzuki, Jo Konagawa | 2012-11-27 |
| 7951981 | Process for producing perfluoroalkyne compound | — | 2011-05-31 |
| 7704893 | Semiconductor device, method for manufacturing semiconductor device and gas for plasma CVD | Yasuo Kobayashi, Kohei Kawamura, Tadahiro Ohmi, Akinobu Teramoto, Toshiro Yamada +1 more | 2010-04-27 |
| 7655572 | Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, control program and computer storage medium | Akinori Kitamura, Masanobu Honda, Nozomi Hirai, Masahiro Nakamura | 2010-02-02 |
| 7652179 | Gas for plasma reaction, process for producing the same, and use thereof | Mitsuru Sugawara, Toshiro Yamada, Kimiaki Tanaka | 2010-01-26 |
| 7449415 | Gas for plasma reaction and process for producing thereof | Toshinobu Hirayama, Toshiro Yamada, Mitsuru Sugawara | 2008-11-11 |
| 7341764 | Gas for plasma reaction, process for producing the same, and use | Mitsuru Sugawara, Toshiro Yamada, Kimiaki Tanaka | 2008-03-11 |
| 6884365 | Gas for plasma reaction and method for production thereof | Toshinobu Hirayama, Toshiro Yamada, Mitsuru Sugawara | 2005-04-26 |
| 6403846 | Fluorinated, saturated hydrocarbons | Akira Sekiya, Toshirou Yamada, Takashi Uruma | 2002-06-11 |
| 6395700 | Process for the preparation of compounds having -CH2-CHF-groups | Toshiro Yamada, Takashi Uruma | 2002-05-28 |
| 6312759 | Fluorinated hydrocarbons, detergents, deterging method, polymer-containing fluids, and method of forming polymer films | Toshirou Yamada, Kuniaki Goto | 2001-11-06 |
| 6010826 | Resist composition | Nobunori Abe, Shugo Matsuno, Hideyuki Tanaka, Yasumasa Wada | 2000-01-04 |