Issued Patents All Time
Showing 26–50 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6265135 | Positive-working electron beam or X-ray resist composition | Kunihiko Kodama, Toshiaki Aoai | 2001-07-24 |
| 6200729 | Positive photosensitive composition | Toshiaki Aoai, Kunihiko Kodama, Tsukasa Yamanaka | 2001-03-13 |
| 6150068 | Photosensitive resin composition for far-ultraviolet exposure | Kenichiro Sato, Kunihiko Kodama, Toshiaki Aoai | 2000-11-21 |
| 6013411 | Positive working photosensitive composition | Toshiaki Aoai, Toru Fujimori, Tsukasa Yamanaka | 2000-01-11 |
| 6010820 | Positive photosensitive composition | Toshiaki Aoai, Kunihiko Kodama, Tsukasa Yamanaka | 2000-01-04 |
| 5981140 | Positive photosensitive composition | Kenichiro Sato, Kunihiko Kodama, Toshiaki Aoai | 1999-11-09 |
| 5955238 | Waterless planographic printing plate and method of plate making using the same | Hiroaki Yokoya, Toshiaki Aoai | 1999-09-21 |
| 5891603 | Positive working photosensitive composition | Kunihiko Kodama, Toshiaki Aoai | 1999-04-06 |
| 5837420 | Positive working photosensitive composition | Toshiaki Aoai, Kunihiko Kodama, Tsukasa Yamanaka | 1998-11-17 |
| 5731123 | Positive image forming composition | Koichi Kawamura | 1998-03-24 |
| 5683856 | Positive-working photosensitive composition | Toshiaki Aoai, Tsukasa Yamanaka | 1997-11-04 |
| 5576139 | Positive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalyst | Shiro Tan, Yasumasa Kawabe, Tadayoshi Kokubo | 1996-11-19 |
| 5565300 | Positive photoresist composition | Shinji Sakaguchi, Tadayoshi Kokubo | 1996-10-15 |
| 5529881 | Postive photoresist composition | Yasumasa Kawabe, Kenichiro Sato, Toshiaki Aoai | 1996-06-25 |
| 5380618 | Micropattern-forming material having a low molecular weight novolak resin, a quinone diazide sulfonyl ester and a solvent | Tadayoshi Kokubo, Shiro Tan, Wataru Ishii | 1995-01-10 |
| 5360692 | Positive type 1,2-naphthoquinonediazide photoresist composition containing benzotriazole light absorbing agent | Yasumasa Kawabe, Tadayoshi Kokubo | 1994-11-01 |
| 5340697 | Negative type photoresist composition | Hiroshi Yoshimoto, Tadayoshi Kokubo | 1994-08-23 |
| 5324619 | Positive quinone diazide photoresist composition containing select polyhydroxy additive | Yasumasa Kawabe, Tadayoshi Kokubo | 1994-06-28 |
| 5290658 | Positive type photoresist composition comprising polyaromatic hydroxy quinone diazide esters as the photosensitive ingredient | Yasumasa Kawabe, Tadayoshi Kokubo | 1994-03-01 |
| 5248582 | Positive-type photoresist composition | Shinji Sakaguchi, Tadayoshi Kokubo | 1993-09-28 |
| 5173389 | Positive-working photoresist composition | Shinji Sakaguchi, Tadayoshi Kokubo | 1992-12-22 |
| 5153096 | Positive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazide | Yasumasa Kawabe, Tadayoshi Kokubo | 1992-10-06 |
| 5089373 | Positive photoresist composition utilizing O-quinonediazide and novolak resin | Yasumasa Kawabe, Tadayoshi Kokubo | 1992-02-18 |
| 4904706 | Soft polyurethane foam from hydroxyl urethane prepolymer and polyester ether polyol | Yasuji Tsunekawa | 1990-02-27 |
| 4894311 | Positive-working photoresist composition | Yasumasa Kawabe, Tadayoshi Kokubo | 1990-01-16 |