Issued Patents All Time
Showing 26–50 of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9023579 | Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition | Shuhei Yamaguchi | 2015-05-05 |
| 9012123 | Positive resist composition and pattern forming method using the same | Kei Yamamoto | 2015-04-21 |
| 8932794 | Positive photosensitive composition and pattern forming method using the same | Toshiaki Fukuhara, Takayuki Kato | 2015-01-13 |
| 8911930 | Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and pattern | Yuichiro Enomoto, Shinji Tarutani, Shuhei Yamaguchi | 2014-12-16 |
| 8846290 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | Naohiro TANGO, Michihiro SHIRAKAWA, Mitsuhiro Fujita, Shuhei Yamaguchi, Shohei Kataoka | 2014-09-30 |
| 8846293 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition | Yusuke Iizuka, Naohiro TANGO, Shohei Kataoka | 2014-09-30 |
| 8841060 | Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device | Shohei Kataoka, Yusuke Iizuka, Tomoki Matsuda, Naohiro TANGO | 2014-09-23 |
| 8715903 | Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same | Hisamitsu Tomeba | 2014-05-06 |
| 8617788 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | Takayuki Kato, Hiroshi Saegusa, Kaoru Iwato, Shuji Hirano, Yusuke Iizuka +1 more | 2013-12-31 |
| 8557499 | Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition | Shuhei Yamaguchi, Shohei Kataoka | 2013-10-15 |
| 8541160 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | — | 2013-09-24 |
| 8460850 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same | Kenichiro Sato, Shuhei Yamaguchi, Hiroshi Inada | 2013-06-11 |
| 7955780 | Positive resist composition and pattern forming method using the same | Takayuki Kato, Yusuke Iizuka | 2011-06-07 |
| 7794916 | Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition | — | 2010-09-14 |
| 7648817 | Positive working resist composition and pattern forming method | Takayuki Kato | 2010-01-19 |
| 7629107 | Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the positive photosensitive composition | Takayuki Kato | 2009-12-08 |
| 7449282 | Lithographic printing plate precursor | — | 2008-11-11 |
| 7435529 | Photosensitive composition and image recording method using the same | Yohei ISHIJI | 2008-10-14 |
| 7422837 | Photosensitive composition | — | 2008-09-09 |
| 7396634 | Photosensitive composition | — | 2008-07-08 |
| 7267925 | Photosensitive composition and novel compound used therefor | — | 2007-09-11 |
| 7232644 | Polymerizable composition and negative-working planographic printing plate precursor using the same | Kazuto Kunita | 2007-06-19 |
| 7169529 | Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image | — | 2007-01-30 |
| 6946956 | Locating system and method for determining positions of objects | Hitoshi Hayashi, Masashi Shimizu, Hirohito Suda | 2005-09-20 |
| 6878505 | Photosensitive composition | Kazuto Kunita | 2005-04-12 |