KH

Kazukuni Hara

DE Denso: 20 patents #415 of 11,792Top 4%
HK Hamamatsu Photonics K.K.: 3 patents #547 of 1,436Top 40%
SK Showa Denko K.K.: 3 patents #463 of 1,736Top 30%
NC Nippondenso Co.: 2 patents #1,150 of 3,479Top 35%
TL Toyota Central R&D Labs: 2 patents #528 of 1,657Top 35%
NT Nuflare Technology: 2 patents #144 of 298Top 50%
📍 Kasugai, JP: #15 of 97 inventorsTop 20%
Overall (All Time): #162,011 of 4,157,543Top 4%
25
Patents All Time

Issued Patents All Time

Showing 1–25 of 25 patents

Patent #TitleCo-InventorsDate
11810783 Gallium nitride semiconductor device and method for manufacturing the same Chiaki Sasaoka, Jun Kojima, Shoichi Onda, Masatake Nagaya, Daisuke Kawaguchi 2023-11-07
11810821 Semiconductor chip and method for manufacturing the same Masatake Nagaya, Daisuke Kawaguchi, Toshiki Yui, Chiaki Sasaoka, Jun Kojima +1 more 2023-11-07
11784039 Method for manufacturing gallium nitride semiconductor device Jun Kojima, Chiaki Sasaoka, Shoichi Onda, Masatake Nagaya, Daisuke Kawaguchi 2023-10-10
11107892 SiC epitaxial wafer and method for producing same Keisuke Fukada, Naoto ISHIBASHI, Akira Bando, Masahiko Ito, Isaho Kamata +7 more 2021-08-31
10896831 Film forming apparatus Kunihiko Suzuki, Naohisa Ikeya, Keisuke Fukada, Masahiko Ito, Isaho Kamata +6 more 2021-01-19
10745824 Film forming apparatus Kunihiko Suzuki, Naohisa Ikeya, Masayoshi Yajima, Hiroaki Fujibayashi, Hideki Matsuura +1 more 2020-08-18
10262863 Method for manufacturing SiC epitaxial wafer by simultaneously utilizing an N-based gas and a CI-based gas, and SiC epitaxial growth apparatus Keisuke Fukada, Masahiko Ito, Isaho Kamata, Hidekazu Tsuchida, Hideyuki Uehigashi +4 more 2019-04-16
9644286 Silicon carbide single crystal manufacturing apparatus 2017-05-09
9328431 Apparatus for manufacturing a silicon carbide single crystal comprising a mounting portion and a purge gas introduction system Yuuichirou Tokuda 2016-05-03
8882911 Apparatus for manufacturing silicon carbide single crystal Yuuichirou Tokuda, Jun Kojima 2014-11-11
7217323 Equipment and method for manufacturing silicon carbide single crystal Naohiro Sugiyama, Yasuo Kitou, Emi Makino, Kouki Futatsuyama, Atsuto Okamoto 2007-05-15
7147714 Manufacturing method of silicon carbide single crystals Masami Naito, Fusao Hirose, Shoichi Onda 2006-12-12
7112242 Manufacturing method for producing silicon carbide crystal using source gases Masao Nagakubo, Shoichi Onda 2006-09-26
6830618 Manufacturing method for producing silicon carbide crystal using source gases and apparatus for the same Masao Nagakubo, Shoichi Onda 2004-12-14
6770137 Manufacturing method for producing silicon carbide crystal using source gases and apparatus for the same Masao Nagakubo, Shoichi Onda 2004-08-03
6746787 Manufacturing method of silicon carbide single crystals Masami Naito, Fusao Hirose, Shoichi Onda 2004-06-08
6670282 Method and apparatus for producing silicon carbide crystal Haruyoshi Kuriyama, Hiroyuki Kondo, Shouichi Onda 2003-12-30
6451112 Method and apparatus for fabricating high quality single crystal Kouki Futatsuyama, Shoichi Onda, Fusao Hirose, Emi Oguri, Naohiro Sugiyama +1 more 2002-09-17
6214108 Method of manufacturing silicon carbide single crystal and silicon carbide single crystal manufactured by the same Atsuto Okamoto, Naohiro Sugiyama, Toshihiko Tani, Nobuo Kamiya, Hiroaki Wakayama +7 more 2001-04-10
6057558 Silicon carbide semiconductor device and manufacturing method thereof Tsuyoshi Yamamoto, Rajesh Kumar, Kunihiko Hara, Yuichi Takeuchi, Masami Naito 2000-05-02
6054752 Semiconductor device Yuichi Takeuchi, Tsuyoshi Yamamoto, Rajesh Kumar, Mitsuhiro Kataoka 2000-04-25
6020600 Silicon carbide semiconductor device with trench Takeshi Miyajima, Norihito Tokura, Hiroo Fuma 2000-02-01
5976936 Silicon carbide semiconductor device Takeshi Miyajima, Norihito Tokura, Hiroo Fuma 1999-11-02
5915180 Process for producing a semiconductor device having a single thermal oxidizing step Norihito Tokura, Takeshi Miyajima, Hiroo Fuma, Hiroyuki Kano 1999-06-22
5723376 Method of manufacturing SiC semiconductor device having double oxide film formation to reduce film defects Yuuichi Takeuchi, Takeshi Miyajima, Norihito Tokura 1998-03-03