Patent Leaderboard
USPTO Patent Rankings Data through Sept 30, 2025
TM

Tetsuya Mori

Canon: 15 patents #4,433 of 19,416Top 25%
HOHoriba: 12 patents #14 of 604Top 3%
SCSumitomo Bakelite Co.: 12 patents #6 of 790Top 1%
OMOmron: 8 patents #355 of 3,089Top 15%
HCHokko Chemical Industry Co.: 7 patents #4 of 157Top 3%
Kawasaki: 5 patents #446 of 2,943Top 20%
PRPromerus: 4 patents #38 of 140Top 30%
PAPanasonic: 2 patents #9,678 of 21,108Top 50%
Sumitomo Electric Industries: 2 patents #9,741 of 21,551Top 50%
ZKZaidan Hojin Biseibutsu Kagaku Kenkyu Kai: 2 patents #56 of 194Top 30%
KEKeihin: 1 patents #237 of 596Top 40%
HKHayashibara Seibutsu Kagaku Kenkyujo: 1 patents #157 of 263Top 60%
HCHayashibara Co.: 1 patents #34 of 78Top 45%
OCOsaka Gas Co.: 1 patents #252 of 689Top 40%
MCMurata Manufacturing Co.: 1 patents #3,462 of 5,295Top 70%
Overall (All Time): #30,557 of 4,157,543Top 1%
68 Patents All Time

Issued Patents All Time

Showing 51–68 of 68 patents

Patent #TitleCo-InventorsDate
6827783 Paste application apparatus and method for applying paste Motoyuki Okeshi 2004-12-07
6818430 Process for producing L-epi-2-inosose and novel process for producing epi-inositol Atsushi Takahashi, Kenji Kanbe, Yuichi Kita, Tsuyoshi Tamamura, Tomio Takeuchi 2004-11-16
6754549 Parts mounting apparatus and parts checking method by the same Takaaki Yokoi, Hiroshi Uchiyama, Kenji Kamakura 2004-06-22
6608666 Reference plate, exposure apparatus, device manufacturing system, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method Nobuyoshi Deguchi 2003-08-19
6280062 Light source device and illumination system Shinichi Shima 2001-08-28
6268902 Exposure apparatus, and manufacturing method for devices using same 2001-07-31
6091481 Positioning method and projection exposure apparatus using the method 2000-07-18
5999270 Projection exposure apparatus and microdevice manufacturing method using the same Masao Kosugi 1999-12-07
5971577 Light source device and illumination system Shinichi Shima 1999-10-26
5814425 Method of measuring exposure condition and/or aberration of projection optical system Yoshiharu Kataoka 1998-09-29
5751404 Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates Eiichi Murakami, Fumio Sakai, Shigeyuki Uzawa, Shigeki Ogawa 1998-05-12
5731193 Recombinant DNA and transformant containing the same Kozo Yamamoto, Tsunetaka Ohta 1998-03-24
5594549 Position detecting method and projection exposure apparatus using the same Eiichi Murakami, Hirohiko Shinonaga 1997-01-14
5331371 Alignment and exposure method Akiyoshi Suzuki 1994-07-19
5309197 Projection exposure apparatus Akiyoshi Suzuki, Hideki Ina 1994-05-03
5268744 Method of positioning a wafer with respect to a focal plane of an optical system Akiyoshi Suzuki 1993-12-07
5166754 Alignment system Akiyoshi Suzuki 1992-11-24
4800655 Solvent recovery system Hitoshi Tamazumi 1989-01-31