Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10144156 | Imprint apparatus, imprint method, and method for producing device | Hideki Matsumoto | 2018-12-04 |
| 9880463 | Imprint method, imprint apparatus, and article manufacturing method | Kohei Wakabayashi, Hideki Matsumoto, Makoto Mizuno | 2018-01-30 |
| 9387607 | Imprint apparatus, imprint method, and method for producing device | Hideki Matsumoto | 2016-07-12 |
| 8586785 | Process for producing catalyst for methacrylic acid production and process for producing methacrylic acid | Atsushi Sudo, Kazuo Shiraishi, Hideki Sugi, Hiroyoshi Nowatari, Tomoaki Kobayashi +1 more | 2013-11-19 |
| 6028220 | Producing acrolein and acrylic acid using a supported dual activity molybdenum, iron, and bismuth based catalyst in a fixed bed multitubular reactor | Koichi Wada, Yoshimasa Seo, Akira Iwamoto, Atsushi Sudo, Kazuo Shiraishi +1 more | 2000-02-22 |
| 5959143 | Catalysts and process for the preparation thereof | Hideki Sugi, Koichi Wada, Kazuo Shiraishi, Toshitake Kojima, Atsushi Umejima +1 more | 1999-09-28 |
| 5929275 | Catalyst and process for producing unsaturated aldehyde and unsaturated acid | Koichi Wada, Akira Iwamoto, Yoshimasa Seo, Atsusi Sudo, Kazuo Shiraishi +1 more | 1999-07-27 |
| 5925887 | Projection exposure apparatus including an optical characteristic detector for detecting a change in optical characteristic of a projection optical system and device manufacturing method using the same | Kazuhito Outsuka, Yuichi Yamada, Kazuhiro Takahashi, Yasuo Hasegawa, Hideki Nogawa +1 more | 1999-07-20 |
| 5917682 | Magnetic head and manufacturing method therefor | Hitoshi Yamanishi, Isamu Aokura, Koichi Osano, Yasushi Inoue | 1999-06-29 |
| 5774310 | Magnetic head and magnetic recording apparatus which prevent generation of a false magnetic head tending to disturb a previously formed magnetic recording track | Shigeyoshi Takai | 1998-06-30 |
| 5751404 | Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates | Eiichi Murakami, Shigeyuki Uzawa, Shigeki Ogawa, Tetsuya Mori | 1998-05-12 |
| 5734462 | Exposure apparatus and exposure method | — | 1998-03-31 |
| 4952060 | Alignment method and a projection exposure apparatus using the same | Hideki Ina, Hitoshi Nakano | 1990-08-28 |
| 4814829 | Projection exposure apparatus | Masao Kosugi, Akiyoshi Suzuki, Hideki Ina, Kazuhito Outsuka, Shigeki Ogawa +1 more | 1989-03-21 |
| 4737824 | Surface shape controlling device | Junji Isohata | 1988-04-12 |