TM

Takahiro Matsumoto

Canon: 69 patents #337 of 19,416Top 2%
MC Mitsubishi Gas Chemical Company: 22 patents #32 of 1,727Top 2%
SC Stanley Electric Co.: 17 patents #27 of 1,072Top 3%
Sumitomo Electric Industries: 14 patents #1,767 of 21,551Top 9%
Mitsubishi Electric: 13 patents #2,044 of 25,717Top 8%
TL Takeda Pharmaceutical Company Limited: 13 patents #85 of 1,531Top 6%
UN Unknown: 10 patents #823 of 83,584Top 1%
Honda Motor Co.: 4 patents #5,328 of 21,052Top 30%
HI Hitachi: 4 patents #8,942 of 28,497Top 35%
MM Mitsubishi Mining: 4 patents #189 of 2,247Top 9%
SC Senju Pharmaceutical Co.: 2 patents #78 of 231Top 35%
MC Murata Manufacturing Co.: 2 patents #2,631 of 5,295Top 50%
HK Hamamatsu Photonics K.K.: 2 patents #676 of 1,436Top 50%
MS Mitsubishi Hitachi Power Systems: 1 patents #495 of 970Top 55%
CC Citizen Watch Co.: 1 patents #668 of 1,225Top 55%
FU Fujirebio: 1 patents #93 of 219Top 45%
HD Hitachi Denshi: 1 patents #119 of 275Top 45%
IT Itochu: 1 patents #9 of 24Top 40%
JA Japan Science And Technology Agency: 1 patents #756 of 2,171Top 35%
JE Jeol: 1 patents #309 of 669Top 50%
KT Kabushiki Kaisha Top: 1 patents #53 of 213Top 25%
BO Bonac: 1 patents #14 of 20Top 70%
MC Mitsui Sugar Co.: 1 patents #30 of 59Top 55%
NS Nippon Steel: 1 patents #2,111 of 4,423Top 50%
OC Ono Sokki Co.: 1 patents #14 of 60Top 25%
TI Takeda Chemical Industries: 1 patents #745 of 1,420Top 55%
📍 Tochigi, JP: #4 of 2,789 inventorsTop 1%
Overall (All Time): #4,555 of 4,157,543Top 1%
174
Patents All Time

Issued Patents All Time

Showing 101–125 of 174 patents

Patent #TitleCo-InventorsDate
6636303 Foreign substance inspecting method and apparatus, which detect a height of a foreign substance, and an exposure apparatus using this inspecting apparatus Hideki Ina, Koichi Sentoku 2003-10-21
6633102 Insulator for armature of dynamo-electric machine Kenji Nagai, Hiroaki Kondo, Hisanobu Higashi 2003-10-14
6605392 X-ray mask structure, and X-ray exposure method and apparatus using the same Keiko Chiba 2003-08-12
6559924 Alignment method, alignment apparatus, profiler, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory Hideki Ina, Koichi Sentoku 2003-05-06
6421124 Position detecting system and device manufacturing method using the same Koichi Sentoku 2002-07-16
6372308 Liquid crystal composition Yasue Yoshioka, Masahiro Johno, Tomoyuki Yui 2002-04-16
6344892 Exposure apparatus and device manufacturing method using same Mitsuro Sugita, Akiyoshi Suzuki 2002-02-05
6304318 Lithography system and method of manufacturing devices using the lithography system 2001-10-16
6285033 Positional deviation detecting method and device manufacturing method using the same 2001-09-04
6258296 Fluorine-substituted compounds and ferrielectric liquid-crystal composition containing the same Masahiro Johno, Yuki Motoyama, Hiroshi Mineta, Tomoyuki Yui 2001-07-10
6217954 Phenyl triester compound and anti-ferroelectric liquid crystal composition containing the same Yuki Motoyama, Masahiro Johno, Tomoyuki Yui 2001-04-17
6171884 Method of manufacturing a chip type electronic element Masuyoshi Houda 2001-01-09
6151095 Anti-ferroelectric liquid crystal cell Yasushi Suzuki, Akira Suguro, Tomoyuki Yui, Masahiro Johno 2000-11-21
6151120 Exposure apparatus and method Hideki Ina 2000-11-21
6001278 Anti-ferroelectric liquid crystal composition Masahiro Johno, Tomoyuki Yui, Yuki Motoyama 1999-12-14
5980780 Racemic compound and anti-ferroelectric liquid crystal composition containing the compound Yuki Motoyama, Tomoyuki Yui, Masahiro Johno 1999-11-09
5976409 Swallow-tail-shaped liquid crystal compound Hiroshi Mineta, Masahiro Johno, Tomoyuki Yui 1999-11-02
5951914 Racemic compound and anti-ferroelectric liquid crystal composition Hiroshi Mineta, Tomoyuki Yui, Masahiro Johno 1999-09-14
5938973 Swallow-tailed compound and ferrielectric liquid crystal composition containing the same Yuki Motoyama, Tomoyuki Yui, Masahiro Johno 1999-08-17
5881596 Urine sampling vessel Akira Tsuji, Ichiro Morimoto 1999-03-16
5847974 Measuring method and apparatus for measuring system having measurement error changeable with time Tetsuzo Mori, Koichi Sentoku, Noriyasu Hasegawa 1998-12-08
5818588 Displacement measuring method and apparatus using plural light beam beat frequency signals Koichi Sentoku 1998-10-06
5782960 Hydrogen separation member Makoto Ogawa, Toshiro Kobayashi, Minoru Sueda, Tetsuya Imai, Shigenori Shirogane +3 more 1998-07-21
5751426 Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object Noriyuki Nose, Minoru Yoshii, Kenji Saitoh, Hiroshi Osawa, Koichi Sentoku +1 more 1998-05-12
5728864 Liquid crystal compound having ferrielectric phase and liquid crystal composition Yuki Motoyama, Tomoyuki Yui, Masahiro Johno, Maki Ito, Hiroshi Mineta 1998-03-17