Issued Patents All Time
Showing 26–50 of 86 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7436490 | Exposure apparatus using blaze type diffraction grating to diffract EUV light and device manufacturing method using the exposure apparatus | — | 2008-10-14 |
| 7433447 | X-ray generator and exposure apparatus | Fumitaro Masaki | 2008-10-07 |
| 7352842 | X-ray generator and exposure apparatus having the same | — | 2008-04-01 |
| 7349524 | X-ray generator and exposure apparatus | Fumitaro Masaki | 2008-03-25 |
| 7312459 | Apparatus for evaluating EUV light source, and evaluation method using the same | Mitsuaki Amemiya | 2007-12-25 |
| 7311407 | Mirror unit, method of producing the same, and exposure apparatus and method using the mirror unit | Takeshi Yamamoto | 2007-12-25 |
| 7280184 | Assembly and adjusting method of optical system, exposure apparatus having the optical system | Takayuki Hasegawa | 2007-10-09 |
| 7276710 | Light source unit and exposure apparatus having the same | Takeshi Yamamoto | 2007-10-02 |
| 7189974 | EUV light spectrum measuring apparatus and calculating method of EUV light intensity | Hajime Kanazawa, Fumitaro Masaki | 2007-03-13 |
| 7133489 | X-ray illumination optical system and X-ray reduction exposure apparatus | Masami Tsukamoto | 2006-11-07 |
| 7091507 | Light generator and exposure apparatus | Fumitaro Masaki | 2006-08-15 |
| 7083290 | Adjustment method and apparatus of optical system, and exposure apparatus | Fumitaro Masaki | 2006-08-01 |
| 7084982 | Optical apparatus, measurement method, and semiconductor device manufacturing method | Takeshi Yamamoto | 2006-08-01 |
| 7003075 | Optical measuring device | Fumitaro Masaki | 2006-02-21 |
| 6999172 | Optical apparatus | Fumitaro Masaki | 2006-02-14 |
| 6985208 | Apparatus and method for retaining mirror, and mirror exchange method | Takeshi Miyachi | 2006-01-10 |
| 6897456 | Differential pumping system and exposure apparatus | Takayuki Hasegawa, Nobuaki Ogushi | 2005-05-24 |
| 6891172 | Differential pumping system and exposure apparatus | Nobuaki Ohgushi, Takayuki Hasegawa, Jun Ito | 2005-05-10 |
| 6867843 | Debris removing system for use in X-ray light source | Nobuaki Ogushi, Yutaka Watanabe | 2005-03-15 |
| 6847696 | Synchrotron radiation measurement apparatus, X-ray exposure apparatus, and device manufacturing method | Hideyuki Chinju, Yutaka Watanabe, Nobuaki Oqushi | 2005-01-25 |
| 6834098 | X-ray illumination optical system and X-ray reduction exposure apparatus | Masami Tsukamoto | 2004-12-21 |
| 6831744 | Mirror device, mirror adjustment method, exposure apparatus, exposure method, and semiconductor device manufacturing method | Fumitaro Masaki | 2004-12-14 |
| 6825481 | Exposure apparatus, control method thereof, and device manufacturing method using the same | — | 2004-11-30 |
| 6826221 | Laser oscillator | Akira Egawa, Michinori Maeda, Kazuya Ohta | 2004-11-30 |
| 6665371 | Synchrotron radiation measurement apparatus, X-ray exposure apparatus, and device manufacturing method | Hideyuki Chinju, Yutaka Watanabe, Nobuaki Ogushi | 2003-12-16 |