Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7659591 | Apparatus having a layer of material configured as a reservoir having an interior capable of holding a liquid | Vladimir Anatolyevich Aksyuk, Nagesh R. Basavanhally, Omar Daniel Lopez | 2010-02-09 |
| 7452741 | Process for manufacturing an apparatus that protects features during the removal of sacrificial materials | Vladimir Anatolyevich Aksyuk, Nagesh R. Basavanhally, Omar Daniel Lopez | 2008-11-18 |
| 7435391 | Light-mediated micro-chemical reactors | Stanley Pau | 2008-10-14 |
| 7081623 | Wafer-based ion traps | Stanley Pau | 2006-07-25 |
| 6967326 | Mass spectrometers on wafer-substrates | Stanley Pau, Joseph Ashley Taylor | 2005-11-22 |
| 6852648 | Semiconductor device having a low dielectric constant dielectric material and process for its manufacture | Omkaram Nalamasu, Elsa Reichmanis, Shu Yang | 2005-02-08 |
| 6566224 | Process for device fabrication | Chorng-Ping Chang | 2003-05-20 |
| 6469390 | Device comprising thermally stable, low dielectric constant material | Chorng-Ping Chang, Kin P. Cheung, Wei Zhu | 2002-10-22 |
| 6350659 | Process of making semiconductor device having regions of insulating material formed in a semiconductor substrate | Chun-Ting Liu | 2002-02-26 |
| 6312766 | Article comprising fluorinated diamond-like carbon and method for fabricating article | Wei Zhu | 2001-11-06 |
| 6149778 | Article comprising fluorinated amorphous carbon and method for fabricating article | Sungho Jin, Ruichen Liu, Wei Zhu | 2000-11-21 |
| 6147407 | Article comprising fluorinated amorphous carbon and process for fabricating article | Sungho Jin, Ruichen Liu, Wei Zhu | 2000-11-14 |
| 5616518 | Process for fabricating integrating circuits | Pang Dow Foo | 1997-04-01 |
| 5344797 | Method of forming interlevel dielectric for integrated circuits | Yih-Cheng Shih | 1994-09-06 |
| 5134447 | Neutral impurities to increase lifetime of operation of semiconductor devices | Kwok Ng | 1992-07-28 |
| 5124014 | Method of forming oxide layers by bias ECR plasma deposition | Pang Dow Foo, Ajit S. Manocha, John F. Miner | 1992-06-23 |
| 5057455 | Formation of integrated circuit electrodes | Pang Dow Foo, William T. Lynch | 1991-10-15 |