| 5461005 |
Method of forming silicide in integrated circuit manufacture |
Sailesh Mansinh Merchant, Ranbir Singh |
1995-10-24 |
| 5328872 |
Method of integrated circuit manufacturing using deposited oxide |
Virendra V. Rana, James Roberts, Ankineedu Velaga |
1994-07-12 |
| 5141897 |
Method of making integrated circuit interconnection |
Virendra V. Rana |
1992-08-25 |
| 5135886 |
Integrated circuit fabrication utilizing amorphous layers |
Arun K. Nanda, Virendra V. Rana |
1992-08-04 |
| 5124014 |
Method of forming oxide layers by bias ECR plasma deposition |
Pang Dow Foo, John F. Miner, Chien-Shing Pai |
1992-06-23 |
| 5084415 |
Metallization processing |
Virendra V. Rana |
1992-01-28 |
| 5068207 |
Method for producing a planar surface in integrated circuit manufacturing |
Chen-Hua Yu |
1991-11-26 |
| 4807013 |
Polysilicon fillet |
— |
1989-02-21 |
| 4554048 |
Anistropic etching |
— |
1985-11-19 |
| 4426246 |
Plasma pretreatment with BCl.sub.3 to remove passivation formed by fluorine-etch |
Stanley H. Kravitz, William E. Willenbrock, Jr. |
1984-01-17 |