MM

Marco Hugo Petrus Moers

AB Asml Netherlands B.V.: 5 patents #820 of 3,192Top 30%
FE Fei: 2 patents #250 of 681Top 40%
📍 Best, NL: #26 of 175 inventorsTop 15%
Overall (All Time): #731,262 of 4,157,543Top 20%
7
Patents All Time

Issued Patents All Time

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
9601310 Charged particle microscope with barometric pressure correction Albert Visscher 2017-03-21
8835846 Imaging a sample in a TEM equipped with a phase plate Bart Buijsse, Radostin Stoyanov Danev 2014-09-16
6897947 Method of measuring aberration in an optical imaging system Hans Van Der Laan 2005-05-24
6862076 Method of determining stray radiation lithographic projection apparatus Heine Melle Mulder 2005-03-01
6819405 Lithographic apparatus, device manufacturing method, and device manufactured thereby Johannes Catharinus Hubertus Mulkens 2004-11-16
6650399 Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations Johannes Jacobus Matheus Baselmans, Hans Van Der Laan, Robert Wilhelm Willekers, Wilhelmus Petrus De Boeij, Marcus Adrianus Van De Kerkhof 2003-11-18
6646729 Method of measuring aberration in an optical imaging system Hans Van Der Laan 2003-11-11