Issued Patents All Time
Showing 26–33 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6440870 | Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures | Hakeem Oluseyi | 2002-08-27 |
| 6423644 | Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures | Hakeem Oluseyi | 2002-07-23 |
| 6415198 | Plasma etching of silicon using a chlorine chemistry augmented with sulfur dioxide | Ajay Kumar, Jeffrey D. Chinn | 2002-07-02 |
| 6399507 | Stable plasma process for etching of films | John Holland, Valentin Todorov, Thorsten Lill | 2002-06-04 |
| 6368978 | Hydrogen-free method of plasma etching indium tin oxide | Ajay Kumar, Jeffrey D. Chinn | 2002-04-09 |
| 6322714 | Process for etching silicon-containing material on substrates | Jeffrey D. Chinn, Stephen Yuen | 2001-11-27 |
| 6132631 | Anisotropic silicon nitride etching for shallow trench isolation in an high density plasma system | Ajay Kumar, Jeffrey D. Chinn | 2000-10-17 |
| 6069086 | Non-HBr shallow trench isolation etch process | Ganming Zhao, Jeff Chinn, Thalia Kong | 2000-05-30 |