Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6697153 | Method and apparatus for analyzing line structures | Marilyn I. Wright | 2004-02-24 |
| 6660543 | Method of measuring implant profiles using scatterometric techniques wherein dispersion coefficients are varied based upon depth | Kevin R. Lensing, Homi E. Nariman, Steven P. Reeves | 2003-12-09 |
| 6660542 | Method of controlling stepper process parameters based upon optical properties of incoming process layers, and system for accomplishing same | — | 2003-12-09 |
| 6643008 | Method of detecting degradation in photolithography processes based upon scatterometric measurements of grating structures, and a device comprising such structures | Kevin R. Lensing | 2003-11-04 |
| 6623994 | Method for calibrating optical-based metrology tools | — | 2003-09-23 |
| 6618149 | Method of identifying film stacks based upon optical properties | — | 2003-09-09 |
| 6614540 | Method and apparatus for determining feature characteristics using scatterometry | — | 2003-09-02 |
| 6602723 | Method of integrating scatterometry metrology structures directly into die design | Richard J. Markle | 2003-08-05 |
| 6597447 | Method and apparatus for periodic correction of metrology data | Kevin R. Lensing | 2003-07-22 |
| 6582863 | Method of controlling photolithography processes based upon scatterometric measurements of sub-nominal grating structures | Kevin R. Lensing | 2003-06-24 |
| 6562635 | Method of controlling metal etch processes, and system for accomplishing same | Kevin R. Lensing, Matthew A. Purdy | 2003-05-13 |
| 6529282 | Method of controlling photolithography processes based upon scatterometric measurements of photoresist thickness, and system for accomplishing same | Richard J. Markle | 2003-03-04 |
| 6524163 | Method and apparatus for controlling a polishing process based on scatterometry derived film thickness variation | — | 2003-02-25 |
| 6479200 | Method of controlling stepper process parameters based upon scatterometric measurements of DICD features | — | 2002-11-12 |
| 6458605 | Method and apparatus for controlling photolithography overlay registration | — | 2002-10-01 |
| 6458610 | Method and apparatus for optical film stack fault detection | Kevin R. Lensing, Marilyn I. Wright | 2002-10-01 |
| 6451700 | Method and apparatus for measuring planarity of a polished layer | Kevin R. Lensing | 2002-09-17 |
| 6433871 | Method of using scatterometry measurements to determine and control gate electrode profiles | Kevin R. Lensing | 2002-08-13 |
| 6383888 | Method and apparatus for selecting wafer alignment marks based on film thickness variation | — | 2002-05-07 |