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RF pulsing within pulsing for semiconductor RF plasma processing |
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Plasma processing apparatus |
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| 12400831 |
Dual frequency matching circuit for inductively coupled plasma (ICP) loads |
— |
2025-08-26 |
| 12347661 |
Pressure control system for a multi-head processing chamber of a plasma processing apparatus |
Changle Guan, Junliang Li |
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| 12340981 |
Workpiece processing apparatus with outer gas channel insert |
Weimin Zeng |
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| 12334312 |
Configurable faraday shield |
— |
2025-06-17 |
| 12322579 |
Metal contamination reduction in substrate processing systems with transformer coupled plasma |
Neema Rastgar, Alexander Paterson |
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| 12283463 |
Systems and methods for multi-level pulsing in RF plasma tools |
Ying Wu, John Drewery, Vikram Singh |
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| 12283467 |
Plasma strip tool with movable insert |
Qiqun Zhang |
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| 12266503 |
Hybrid plasma source array |
— |
2025-04-01 |
| 12261029 |
Protection system for switches in direct drive circuits of substrate processing systems |
Yuhou Wang, Michael J. Martin, Alexander Paterson |
2025-03-25 |
| 12261073 |
Electrostatic chuck assembly for plasma processing apparatus |
— |
2025-03-25 |
| 12193138 |
Matchless plasma source for semiconductor wafer fabrication |
Yuhou Wang, Ricky Marsh, Alex Paterson |
2025-01-07 |
