HK

Hirotomo Kawahara

AG Agc: 3 patents #11 of 231Top 5%
📍 Tokyo, CA: #64 of 241 inventorsTop 30%
Overall (2025): #60,723 of 469,880Top 15%
3
Patents 2025

Issued Patents 2025

Showing 1–3 of 3 patents

Patent #TitleCo-InventorsDate
12298660 Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing same Daijiro AKAGI, Hiroaki IWAOKA, Toshiyuki Uno, Michinori Suehara, Keishi TSUKIYAMA 2025-05-13
12235575 Reflective mask blank for EUV lithography and substrate with conductive film Yusuke Ono, Hiroshi Hanekawa 2025-02-25
12216397 Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereof Daijiro AKAGI, Toshiyuki Uno, Ichiro Ishikawa, Kenichi Sasaki 2025-02-04