Issued Patents 2024
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12183805 | Semiconductor device and manufacturing method thereof | Zhi-Qiang WU, Kuo-An Liu, Chan-Lon Yang, Bharath Kumar Pulicherla, Chung-Cheng Wu +2 more | 2024-12-31 |
| 12154970 | Method for semiconductor device structure | Tze-Chung Lin, Han-Yu Lin, Pinyen Lin | 2024-11-26 |
| 12154969 | Semiconductor device structure with metal gate stack | Jung-Hao Chang, Pinyen Lin | 2024-11-26 |
| 12125897 | Air spacers in transistors and methods forming same | Yi-Lun Chen, Chao-Hsien Huang, Chun-Hsiung Lin | 2024-10-22 |
| 12094951 | Capping structures in semiconductor devices | Po-Chin Chang, Ming-Huan Tsai, Pinyen Lin | 2024-09-17 |
| 12087558 | Ion beam etching apparatus and method | Jung-Hao Chang, Po-Chin Chang, Pinyen Lin | 2024-09-10 |
| 12046676 | Semiconductor devices and methods of manufacturing thereof | Yu-Lien Huang, Yi-Shan Chen, Kuan Da Huang, Han-Yu Lin, Ming-Huan Tsai | 2024-07-23 |
| 12034059 | Reducing pattern loading in the etch-back of metal gate | Po-Chin Chang, Wei-Hao Wu, Pinyen Lin | 2024-07-09 |
| 12033863 | Semiconductor fabrication system embedded with effective baking module | Han-Yu Lin, Yi-Ruei Jhan, Fang-Wei Lee, Pinyen Lin, Tze-Chung Lin | 2024-07-09 |
| 12027625 | Semiconductor device having fins and method of fabricating the same | Shu-Hao Kuo, Jung-Hao Chang, Chao-Hsien Huang, Kuo-Cheng Ching | 2024-07-02 |
| 12021125 | High selectivity etching with germanium-containing gases | Tze-Chung Lin, Pinyen Lin, Fang-Wei Lee, Han-Yu Lin | 2024-06-25 |
| 12014954 | Method and equipment for forming gaps in a material layer | Chan Syun David Yang, Yu-Ming Lin | 2024-06-18 |
| 12002663 | Processing apparatus and method for forming semiconductor structure | Yu-Rung Hsu, Pinyen Lin | 2024-06-04 |
| 11978672 | Semiconductor device with elongated pattern | Po-Chin Chang, Pinyen Lin | 2024-05-07 |
| 11973129 | Semiconductor device structure with inner spacer layer and method for forming the same | Han-Yu Lin, Chansyun David Yang, Fang-Wei Lee, Tze-Chung Lin, Pinyen Lin | 2024-04-30 |
| 11942372 | Dielectric protection layer in middle-of-line interconnect structure manufacturing method | Kuan Da Huang, Hao-Heng Liu | 2024-03-26 |
| 11942367 | Semiconductor device and method of manufacture | Chan Syun David Yang, Chun-Jui Huang | 2024-03-26 |
| 11929424 | Semiconductor device and method for forming the same | Yi-Chen Lo, Pinyen Lin | 2024-03-12 |
| 11908685 | Methods of reducing gate spacer loss during semiconductor manufacturing | Yi-Ruei Jhan, Han-Yu Lin, Pinyen Lin | 2024-02-20 |
| 11908701 | Patterning method and manufacturing method of semiconductor device | Christine Y Ouyang | 2024-02-20 |
| 11901190 | Method of patterning | Chin-Yuan Tseng, Yu-Tien Shen, Wei-Liang Lin, Chih-Ming Lai, Kuo-Cheng Ching +2 more | 2024-02-13 |
| 11881401 | Method of forming metal features | Po-Chin Chang, Ru-Gun Liu, Wei-Liang Lin, Pinyen Lin, Yu-Tien Shen +1 more | 2024-01-23 |
| 11862465 | Fine line patterning methods | Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Po-Chin Chang +7 more | 2024-01-02 |