Issued Patents 2024
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12183808 | Reducing parasitic capacitance for gate-all-around device by forming extra inner spacers | Chih-Hao Wang, Shi Ning Ju, Kuan-Lun Cheng | 2024-12-31 |
| 12148815 | Fin field effect transistor device structure | Kuan-Ting Pan, Shi Ning Ju, Chih-Hao Wang | 2024-11-19 |
| 12148673 | FinFET devices and methods of forming the same | Chih-Hao Wang, Jui-Chien Huang, Chun-Hsiung Lin, Pei-Hsun Wang | 2024-11-19 |
| 12142635 | Gate all-around semiconductor device | Ka-Hing Fung, Ying-Keung Leung | 2024-11-12 |
| 12119266 | Semiconductor arrangement and method of manufacture | Lung-Kun Chu, Mao-Lin Huang, Chung-Wei Hsu | 2024-10-15 |
| 12107153 | Semiconductor device and manufacturing method thereof | Shi Ning Ju, Kuan-Ting Pan, Kuan-Lun Cheng, Chih-Hao Wang | 2024-10-01 |
| 12087636 | Semiconductor device including a FinFET structure and method for fabricating the same | Zhi-Chang Lin, Shi Ning Ju, Chih-Hao Wang, Kuan-Ting Pan | 2024-09-10 |
| 12057507 | Method for manufacturing semiconductor device structure | Kuan-Ting Pan, Kuan-Lun Cheng, Chih-Hao Wang | 2024-08-06 |
| 12034062 | Semiconductor device structure and method for forming the same | Zhi-Chang Lin, Kuan-Ting Pan, Chih-Hao Wang, Shi Ning Ju | 2024-07-09 |
| 12027625 | Semiconductor device having fins and method of fabricating the same | Shu-Hao Kuo, Jung-Hao Chang, Chao-Hsien Huang, Li-Te Lin | 2024-07-02 |
| 11972981 | FinFET channel on oxide structures and related methods | Ching-Wei Tsai, Ying-Keung Leung | 2024-04-30 |
| 11948970 | Semiconductor device and manufacturing method thereof | Ching-Wei Tsai, Kuan-Lun Cheng, Chih-Hao Wang | 2024-04-02 |
| 11948839 | Power reduction in finFET structures | Chih-Hao Wang, Kuan-Lun Cheng | 2024-04-02 |
| 11942548 | Multi-gate device and method of fabrication thereof | Ching-Wei Tsai, Carlos H. Diaz, Chih-Hao Wang, Wai-Yi Lien, Ying-Keung Leung | 2024-03-26 |
| 11942476 | Method for forming semiconductor device with helmet structure between two semiconductor fins | Shi Ning Ju, Chih-Hao Wang | 2024-03-26 |
| 11935921 | Dielectric structures for semiconductor devices | Kuan-Lun Cheng, Chih-Hao Wang | 2024-03-19 |
| 11901190 | Method of patterning | Chin-Yuan Tseng, Yu-Tien Shen, Wei-Liang Lin, Chih-Ming Lai, Shi Ning Ju +2 more | 2024-02-13 |
| 11894275 | FinFET device having oxide region between vertical fin structures | Ying-Keung Leung | 2024-02-06 |
| 11894443 | Method of making gate structure of a semiconductor device | Ming Zhu, Hui-Wen Lin, Harry-Hak-Lay Chuang, Bao-Ru Young, Yuan-Sheng Huang +4 more | 2024-02-06 |
| 11889674 | Structure and method for SRAM FinFET device having an oxide feature | Ka-Hing Fung, Chih-Sheng Chang, Zhiqiang Wu | 2024-01-30 |