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Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles |
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Printing a chemical mechanical polishing pad |
Barry Chin, Terrance Y. Lee |
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Techniques for combining CMP process tracking data with 3D printed CMP consumables |
Jason Garcheung Fung, Daniel Redfield, Aniruddh Jagdish Khanna, Mario CORNEJO, Gregory E. Menk +1 more |
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| 11980992 |
Integrated abrasive polishing pads and manufacturing methods |
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Apparatus and method of forming a polishing article that has a desired zeta potential |
Ashwin Chockalingham, Mahendra C. ORILALL, Mayu YAMAMURA, Boyi Fu, Daniel Redfield |
2024-04-23 |
| 11965103 |
Additive manufacturing of polishing pads |
Yingdong Luo, Sivapackia Ganapathiappan, Ashwin CHOCKALINGAM, Daihua Zhang, Uma Sridhar +4 more |
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| 11958162 |
CMP pad construction with composite material properties using additive manufacturing processes |
Kasiraman Krishnan, Mahendra C. ORILALL, Daniel Redfield, Fred C. Redeker, Nag B. Patibandla +4 more |
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| 11951590 |
Polishing pads with interconnected pores |
Shiyan Akalanka Jayanath WEWALA GONNAGAHADENIYAGE, Ashwin CHOCKALINGAM, Jason Garcheung Fung, Veera Raghava Reddy Kakireddy, Nandan BARADANAHALLI KENCHAPPA +1 more |
2024-04-09 |
| 11911870 |
Polishing pads for high temperature processing |
Sivapackia Ganapathiappan, Yingdong Luo, Aniruddh Jagdish Khanna, You Wang, Daniel Redfield |
2024-02-27 |
| 11897079 |
Low-temperature metal CMP for minimizing dishing and corrosion, and improving pad asperity |
Haosheng Wu, Hari Soundararajan, Jianshe Tang, Shou-Sung Chang, Brian J. Brown +2 more |
2024-02-13 |
| 11878389 |
Structures formed using an additive manufacturing process for regenerating surface texture in situ |
Puneet Narendra JAWALI, Veera Raghava Reddy Kakireddy, Daniel Redfield |
2024-01-23 |