RB

Rajeev Bajaj

Applied Materials: 11 patents #20 of 1,809Top 2%
Overall (2024): #7,519 of 561,600Top 2%
11
Patents 2024

Issued Patents 2024

Patent #TitleCo-InventorsDate
12023853 Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles Kasiraman Krishnan, Daniel Redfield, Russell Edward Perry, Gregory E. Menk, Fred C. Redeker +3 more 2024-07-02
12011801 Printing a chemical mechanical polishing pad Barry Chin, Terrance Y. Lee 2024-06-18
11986922 Techniques for combining CMP process tracking data with 3D printed CMP consumables Jason Garcheung Fung, Daniel Redfield, Aniruddh Jagdish Khanna, Mario CORNEJO, Gregory E. Menk +1 more 2024-05-21
11980992 Integrated abrasive polishing pads and manufacturing methods Ashavani Kumar, Ashwin CHOCKALINGAM, Sivapackia Ganapathiappan, Boyi Fu, Daniel Redfield +6 more 2024-05-14
11964359 Apparatus and method of forming a polishing article that has a desired zeta potential Ashwin Chockalingham, Mahendra C. ORILALL, Mayu YAMAMURA, Boyi Fu, Daniel Redfield 2024-04-23
11965103 Additive manufacturing of polishing pads Yingdong Luo, Sivapackia Ganapathiappan, Ashwin CHOCKALINGAM, Daihua Zhang, Uma Sridhar +4 more 2024-04-23
11958162 CMP pad construction with composite material properties using additive manufacturing processes Kasiraman Krishnan, Mahendra C. ORILALL, Daniel Redfield, Fred C. Redeker, Nag B. Patibandla +4 more 2024-04-16
11951590 Polishing pads with interconnected pores Shiyan Akalanka Jayanath WEWALA GONNAGAHADENIYAGE, Ashwin CHOCKALINGAM, Jason Garcheung Fung, Veera Raghava Reddy Kakireddy, Nandan BARADANAHALLI KENCHAPPA +1 more 2024-04-09
11911870 Polishing pads for high temperature processing Sivapackia Ganapathiappan, Yingdong Luo, Aniruddh Jagdish Khanna, You Wang, Daniel Redfield 2024-02-27
11897079 Low-temperature metal CMP for minimizing dishing and corrosion, and improving pad asperity Haosheng Wu, Hari Soundararajan, Jianshe Tang, Shou-Sung Chang, Brian J. Brown +2 more 2024-02-13
11878389 Structures formed using an additive manufacturing process for regenerating surface texture in situ Puneet Narendra JAWALI, Veera Raghava Reddy Kakireddy, Daniel Redfield 2024-01-23