Issued Patents 2022
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11522065 | Gate etch back with reduced loading effect | Yi-Chen Lo, Jung-Hao Chang, Pinyen Lin | 2022-12-06 |
| 11515423 | Semiconductor device having fins | Shu-Hao Kuo, Jung-Hao Chang, Chao-Hsien Huang, Kuo-Cheng Ching | 2022-11-29 |
| 11469143 | Semiconductor device with elongated pattern | Po-Chin Chang, Pinyen Lin | 2022-10-11 |
| 11424341 | Semiconductor device | Yi-Chen Lo, Pinyen Lin | 2022-08-23 |
| 11417751 | Semiconductor device structure and method for forming the same | Tze-Chung Lin, Han-Yu Lin, Pinyen Lin | 2022-08-16 |
| 11373878 | Technique for semiconductor manufacturing | Han-Yu Lin, Tze-Chung Lin, Fang-Wei Lee, Yi-Lun Chen, Jung-Hao Chang +4 more | 2022-06-28 |
| 11351635 | Apparatus and method for directional etch with micron zone beam and angle control | Chansyun David Yang, Pinyen Lin | 2022-06-07 |
| 11264281 | Semiconductor device with reduced loading effect | Wei-Lun Chen, Chao-Hsien Huang | 2022-03-01 |
| 11244856 | Method and equipment for forming gaps in a material layer | Chan Syun David Yang, Yu-Ming Lin | 2022-02-08 |
| 11239078 | Fine line patterning methods | Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Po-Chin Chang +7 more | 2022-02-01 |
| 11222794 | Semiconductor fabrication system embedded with effective baking module | Han-Yu Lin, Yi-Ruei Jhan, Fang-Wei Lee, Pinyen Lin, Tze-Chung Lin | 2022-01-11 |
| 11217487 | Semiconductor arrangement and method of manufacture | Yi-Chen Lo, Pinyen Lin | 2022-01-04 |